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Formation of uniform square-shaped tunnel pit by electrochemical etching with an opened polyimide layer on aluminum foil

机译:在铝箔上用开放的聚酰亚胺层通过电化学蚀刻形成均匀的方形隧道坑

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摘要

Uniform tunnel pits are fabricated with equally spaced intervals while avoiding excessive dissolution of an aluminum surface with a polyimide material as a mask layer. To increase the area S of capacitance C, uniform tunnel pits are made selectively to increase the aluminum surface area S into the vertical direction on Al foil. In this article, the relationship between the surface area and the etching tunnel is analyzed through selective electrochemical etching with patterning on aluminum foil, and the controllability of the etching tunnel is also studied.
机译:以等间隔的间隔制造均匀的隧道凹坑,同时避免使用聚酰亚胺材料作为掩模层过度溶解铝表面。为了增加电容C的面积S,选择性地制作均匀的隧道凹坑以在Al箔上沿垂直方向增加铝表面积S。本文通过在铝箔上进行图案化的选择性电化学刻蚀,分析了表面积与刻蚀通道之间的关系,并研究了刻蚀通道的可控性。

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