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Microstructure and fracture strength of different grades of freestanding diamond films deposited by a DC Arc Plasma Jet process

机译:通过直流电弧等离子体喷射工艺沉积的不同等级的独立式金刚石薄膜的组织和断裂强度

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摘要

The mechanical properties of chemically vapor deposited diamond films can be characterized in terms of fracture strength. In this paper, different grades of freestanding diamond films were deposited by DC Arc Plasma Jet chemical vapor deposition (CVD) under a variety of deposition conditions. The microstructure and fracture strength of different grades of diamond films were investigated by SEM, X-ray diffraction, Raman spectroscopy and three-point bending, respectively. The columnar structure has great influence on fracture strength; if a columnar structure exists in diamond films, we have found that the fracture strength may not higher than 250 MPa. There is a trend that dominant orientations of optical and mechanical grade diamond films with higher fracture strength are all {220}. As for the fracture mode, optical grade diamond film is mainly intergranular fracture at the lower temperature; at the higher deposition temperature, optical grade diamond film show transcrystalline fracture mode. Fracture mode of mechanical grade diamond film is mainly transcrystalline fracture. (C) 2004 Elsevier B.V. All rights reserved.
机译:化学气相沉积的金刚石膜的机械性能可以通过断裂强度来表征。在本文中,在各种沉积条件下,通过直流电弧等离子体喷射化学气相沉积(CVD)沉积了不同等级的独立式金刚石膜。通过SEM,X射线衍射,拉曼光谱和三点弯曲分别研究了不同等级金刚石膜的显微组织和断裂强度。柱状结构对断裂强度有很大影响。如果发现金刚石膜中存在柱状结构,我们发现断裂强度可能不高于250 MPa。趋势是,具有较高断裂强度的光学和机械级金刚石薄膜的主要取向均为{220}。至于断裂方式,光学级金刚石薄膜在较低温度下主要为晶间断裂;在较高的沉积温度下,光学级金刚石薄膜表现出跨晶断裂模式。机械级金刚石薄膜的断裂方式主要是跨晶断裂。 (C)2004 Elsevier B.V.保留所有权利。

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