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首页> 外文期刊>Surface & Coatings Technology >Adhesion improvement of hydrogenated diamond-like carbon thin films by pre-deposition plasma treatment of rubber substrate
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Adhesion improvement of hydrogenated diamond-like carbon thin films by pre-deposition plasma treatment of rubber substrate

机译:橡胶基材的预沉积等离子处理改善氢化类金刚石碳薄膜的附着力

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摘要

For reduction of friction and enhancement of wear resistance of dynamic rubber seals, thin films of hydrogenated diamond-like carbon (DLC) have been deposited on hydrogenated nitrile butadiene rubber (HNBR) via magnetron-enhanced plasma chemical vapor deposition (ME-PCVD). Pre-deposition plasma treatment of HNBR substrate is proved to be crucial for the improvement of film performance due to enhanced interfacial adhesion. The columnar structure and the crack network formed during deposition enhance the flexibility of DLC thin films and exhibit strain tolerance up to 5%. Below 50% stretch strain and after unloading, thin DLC films of similar to 300 nm thickness still adhere on the rubber substrates and no spallation or delamination is observed. The thin DLC film deposited on Ar-plasma pre-treated rubber at -400 V substrate bias potential exhibits a very low coefficient of friction of 0.175 (compared to > 1 of uncoated HNBR rubber). After tribotests even under high normal load of 3 N, almost no wear can be seen on the films. Such tribological property is even better than that of 1 mu m thick DLC or Me-DLC coated rubbers.
机译:为了减少摩擦并增强动态橡胶密封件的耐磨性,已通过磁控管增强的等离子体化学气相沉积(ME-PCVD)将氢化类金刚石碳(DLC)薄膜沉积在氢化丁腈橡胶(HNBR)上。事实证明,HNBR基板的预沉积等离子体处理由于界面粘合力的增强,对于改善薄膜性能至关重要。沉积过程中形成的柱状结构和裂纹网络增强了DLC薄膜的柔韧性,并显示出高达5%的应变容限。拉伸应变低于50%时,在卸载后,厚度约300 nm的薄DLC薄膜仍粘附在橡胶基材上,未观察到剥落或分层。在-400 V衬底偏压下沉积在Ar-等离子预处理橡胶上的DLC薄膜显示出非常低的摩擦系数,为0.175(与未涂覆的HNBR橡胶的> 1相比)。经过摩擦测试,即使在3 N的高正常负载下,薄膜上也几乎看不到磨损。这种摩擦性能甚至优于1微米厚的DLC或Me-DLC涂覆的橡胶。

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