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Characterisation of tungsten coatings by pulsed current plating from molten salt in air atmosphere

机译:空气中熔融盐中的脉冲电流镀对钨涂层的表征

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摘要

Pure and compact tungsten coatings with high (200)-orientation were successfully electro-deposited from Na_2WO_4-WO_3 binary oxide molten salt by direct and pulse current techniques on copper based alloy substrate in air atmosphere at 1173 K. The tungsten coatings and copper alloy substrates combined well with no obvious voids and cracks. In addition, the influence of pulse plating on the microstructure, crystal structure and Vickers microhardness of coatings, adhesive strength between coatings and substrates as well as the current efficiency was investigated. It was also observed that applied pulse current led to tungsten coatings with better mechanical properties than those obtained by direct current plating. In addition, a tungsten coating of 500 μm which had lower oxygen content and higher adhesive strength than the coating obtained by the plasma spray method was obtained.
机译:通过直流电和脉冲电流技术,在空气气氛中以1173 K的电势将Na_2WO_4-WO_3二元氧化物熔盐成功地电沉积了高取向(200)取向的纯而致密的钨涂层。钨涂层和铜合金涂层结合得很好,没有明显的空隙和裂缝。此外,研究了脉冲电镀对涂层的显微组织,晶体结构和维氏显微硬度,涂层与基材之间的粘合强度以及电流效率的影响。还观察到,施加的脉冲电流导致钨涂层具有比直流电镀获得的更好的机械性能。另外,获得了500μm的钨涂层,该钨涂层具有比通过等离子体喷涂方法获得的涂层更低的氧含量和更高的粘合强度。

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