首页> 外文期刊>Applied Surface Science >Effects of cathodic current density and temperature on morphology and microstructure of iridium coating prepared by electrodeposition in molten salt under the air atmosphere
【24h】

Effects of cathodic current density and temperature on morphology and microstructure of iridium coating prepared by electrodeposition in molten salt under the air atmosphere

机译:阴极电流密度和温度对空气气氛下熔融盐中电沉积铱涂层的形貌和微观结构的影响

获取原文
获取原文并翻译 | 示例

摘要

Iridium coating was prepared on a Re/C substrate (graphite substrate coated with rhenium coating by CVD) using electrodeposition in molten salt of chlorides in the air atmosphere. The effects of cathodic current density and temperature on both the morphology and microstructure of the coating were studied, respectively. The morphology and orientation of the coating were determined by scanning electron microscope and X-ray diffraction, respectively. The results showed that the cathodic current density and temperature both affected the surface morphology, roughness, grain size and compactness of the iridium coating. With increasing of current density from 5 to 50mA/cm~2, the surface roughness of the coating increased from Ra 0.98 to Ra 6.29 μm, while the grain size decreased. With temperature increasing from 520 to 640℃, the surface roughness of the coating decreased from Ra 4.41 to Ra 1.16 μm, while the grain size increased. The preferred orientations of the coatings changed in the row <111>-<220>-<311> with current density increasing. With the increase of temperature, the preferred orientation of the coating changed from <111 > to <220>, and again to <111 >. The coating with <111 > orientation was smoother and denser than that with <220> orientation regardless of the grain size.
机译:通过在空气气氛中在氯化物的熔融盐中电沉积,在Re / C衬底(通过CVD涂覆有coating涂层的石墨衬底)上制备铱涂层。研究了阴极电流密度和温度对涂层形貌和微观结构的影响。分别通过扫描电子显微镜和X射线衍射确定涂层的形态和取向。结果表明,阴极电流密度和温度均会影响铱涂层的表面形貌,粗糙度,晶粒尺寸和致密性。随着电流密度从5mA / cm〜2增加到50mA / cm〜2,涂层的表面粗糙度从Ra 0.98增加到Ra 6.29μm,而晶粒尺寸减小。随着温度从520℃升高到640℃,涂层的表面粗糙度从Ra 4.41降低到Ra 1.16μm,而晶粒尺寸增加。随着电流密度的增加,行<111>-<220>-<311>中涂层的优选取向发生了变化。随着温度的升高,涂层的优选取向从<111>变为<220>,并再次变为<111>。不管晶粒大小如何,<111>取向的涂层都比<220>取向的涂层光滑和致密。

著录项

  • 来源
    《Applied Surface Science》 |2013年第15期|537-545|共9页
  • 作者单位

    Department of Materials Engineering and Applied Chemistry, College of Aerospace and Materials Engineering, National University of Defence Technology, Changsha 410073, PR China;

    Department of Materials Engineering and Applied Chemistry, College of Aerospace and Materials Engineering, National University of Defence Technology, Changsha 410073, PR China;

    Department of Materials Engineering and Applied Chemistry, College of Aerospace and Materials Engineering, National University of Defence Technology, Changsha 410073, PR China;

    Department of Materials Engineering and Applied Chemistry, College of Aerospace and Materials Engineering, National University of Defence Technology, Changsha 410073, PR China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    iridium coating; microstructure; orientation; molten salt; electrodeposition; air atmosphere;

    机译:铱涂层;微观结构取向;熔盐电沉积空气气氛;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号