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Electrical and Thermal Interface Conductance of Carbon Nanotubes Grown under Direct Current Bias Voltage

机译:直流偏置电压下生长的碳纳米管的电和热界面电导

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The electrical resistance of individual multiwalled carbon nanotubes and the thermal interface resistance of nanotube arrays are investigated as functions of dc bias voltage used during growth. Nanotubes were grown from Fe2O3 nanoparticles supported on Ti/SiO2/Si substrates by microwave plasma chemical vapor deposition (MPCVD) under dc bias voltages of -200, -100, 0, +100, and +200 V. Electrical resistances of individual nanotubes were obtained from I—V measurements of randomly selected nanotubes, while thermal interface resistances of nanotube arrays were measured using a photoacoustic technique. The study reveals that individual nanotubes and nanotube arrays grown under positive dc bias voltage (+200 V) show significant increases in their electrical and thermal interface conductance, respectively. The nanotubes have been further characterized by X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and electron microscopy in order to account for the marked differences in electrical and thermal interface conductance.
机译:研究了单个多壁碳纳米管的电阻和纳米管阵列的热界面电阻,作为生长过程中使用的直流偏置电压的函数。通过在-200,-100、0,+ 100和+200 V的直流偏置电压下通过微波等离子体化学气相沉积(MPCVD),将负载在Ti / SiO2 / Si衬底上的Fe2O3纳米颗粒制成纳米管。单个纳米管的电阻为通过随机选择的纳米管的IV测量获得纳米管,同时使用光声技术测量纳米管阵列的热界面电阻。研究表明,在正直流偏置电压(+200 V)下生长的单个纳米管和纳米管阵列分别显示出其电和热界面电导率显着增加。为了解决电和热界面电导的显着差异,已经通过X射线光电子能谱(XPS),拉曼光谱和电子显微镜进一步表征了纳米管。

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