首页> 外文期刊>The Journal of Chemical Physics >Reaction dynamics of the As-rich GaAs(001)-2 * 4 surface with monoenergetic Br_2 molecules: A scanning tunneling microscopy study
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Reaction dynamics of the As-rich GaAs(001)-2 * 4 surface with monoenergetic Br_2 molecules: A scanning tunneling microscopy study

机译:富砷GaAs(001)-2 * 4表面与单能Br_2分子的反应动力学:扫描隧道显微镜研究

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摘要

The adsorption of 0.15-eV and 0.89-eV Br_2 onto the As-rich GaAs(001)-2 * 4 surface at 300 K has been investigated on the atomic scale over a wide range of total Br coverage using scanning tunneling microscopy (STM). It is found that the strained As-As dimer bonds and the As-Ga back bonds are significantly weakened and chemically activated by the Br atoms site-selectively adsorbed onto the second-layer Ga atoms. Consequently, at higher Br coverages, incident Br_2 will preferentially react with these As-As and As-Ga Bonds, removing (etching) As-As dimers and forming AsBr((s)) or AsBr_(2(s)) species, GaBr_((s)) chains, and etching pit islands. The incident energy of Br_2 has a strong effect on the adsorption mechanisms.
机译:使用扫描隧道显微镜(STM)在300 K的原子尺度上研究了0.15-eV和0.89-eV Br_2在富K的GaAs(001)-2 * 4表面上的吸附。发现应变的As-As二聚体键和As-Ga背键显着弱化并通过位点选择性吸附在第二层Ga原子上的Br原子被化学活化。因此,在较高的Br覆盖率下,入射的Br_2将优先与这些As-As和As-Ga键反应,去除(蚀刻)As-As二聚体并形成AsBr(s)或AsBr_(2(s))物种GaBr_ ((s))链条和蚀刻坑岛。 Br_2的入射能对吸附机理有很大的影响。

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