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Theoretical Modeling for Optical Properties of a Si Delta-Doped InGaN/GaN Quantum Well

机译:Si Delta掺杂InGaN / GaN量子阱的光学特性的理论建模

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By means of a self-consistent numerical method we have analyzed the effect of a Si δ-doped GaN barrier on the electrical and optical properties of an In_(0.05)Ga_(0.95)N/GaN single quantum well (SQW). Our theoretical study about four samples with UV emission of 374 nm shows: (1) there is a considerable concentration of free electrons, as well as a higher energy for intersubband transitions in the samples with their delta layers located in the range 8 and 12 nm away from the InGaN QW, (2) the emission intensity depends on the position of the delta-doped layer with their peaks fitted by a Gaussian function. The theoretical results are compatible with the experimental data reported in the literature in 2007 by Kwon et al.
机译:通过自洽数值方法,我们分析了Siδ掺杂的GaN势垒对In_(0.05)Ga_(0.95)N / GaN单量子阱(SQW)的电学和光学性质的影响。我们对374 nm紫外线发射的四个样品的理论研究表明:(1)δ层在8和12 nm范围内的样品中存在相当大的自由电子浓度,以及更高的能量用于子带间跃迁(2)的发射强度取决于InGaN QW,其发射强度取决于δ掺杂层的位置,其峰值由高斯函数拟合。理论结果与Kwon等人2007年文献报道的实验数据相符。

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