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A Comparison Between X-ray Reflectivity and Atomic Force Microscopy on the Characterization of a Surface Roughness

机译:X射线反射率和原子力显微镜在表面粗糙度表征上的比较

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摘要

X-ray reflectivity and atomic force microscopy are two complementary tools in characterizing the surface morphology of a solid sample. However, the measured results reported by these two methods were usually not consistent. To understand this inconsistency, a possible interpretation for X-ray reflectivity and atomic force microscopy on the surface characterization of a solid sample is described. The difference in these two methods is the X-ray beam covers a larger area of few mm~(2) on the sample surface while the atomic force microscopy probes only a local area (around (mu)m~(2)). The lateral resolution of X-ray reflectivity is about 0.1 nm depending on the wavelength of the X-ray source and while the AFM is limited by the dimension of the tip. In general, the surface roughness measured by AFM should be smoother than that obtained by X-ray reflectivity. However, the surface contamination complicates the measurements for both methods, especially, for these samples with roughness less than 1 nm.
机译:X射线反射率和原子力显微镜是表征固体样品表面形态的两个互补工具。但是,这两种方法报告的测量结果通常不一致。为了理解这种不一致,描述了对固体样品的表面表征的X射线反射率和原子力显微镜的可能解释。这两种方法的区别在于,X射线束在样品表面覆盖了几mm〜(2)的较大区域,而原子力显微镜仅探测了一个局部区域(约μm〜(2))。 X射线反射率的横向分辨率大约为0.1 nm,具体取决于X射线源的波长,而AFM受尖端尺寸的限制。通常,通过AFM测量的表面粗糙度应比通过X射线反射率获得的表面粗糙度更平滑。但是,表面污染使两种方法的测量都变得复杂,尤其是对于粗糙度小于1 nm的这些样品。

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