Extreme ultraviolet nanolithography for ULSI: A review

摘要

The basic concepts of high-resolution extreme ultraviolet nanolithography, which is aimed at producing ultra-large-scale integrated circuits (with an integration one or two orders of magnitude exceeding present-day integration levels), are reviewed and substantiated. The problems in and the current status of this field of technology are considered. (c) 2005 Pleiades Publishing, Inc.