Optimization of film thickness profiles using a magnetic cusp homogenizer

摘要

In this paper we report on our investigations of the effects of a magnetic cusp plasma homogenizer on thin film deposition profiles produced by cathodic vacuum arcs as a function of distance between the homogenizer and the plasma beam source. Both filtered and unfiltered arc plasma sources were examined. The thickness profiles of titanium films deposited onto transparent media were mapped using a quantitative optical technique based on depositing the films onto transparence foils and analysing the resulting image. The thickness homogeneity of the films was found to improve as the distance between the plasma source and homogenizer increased; however the deposition rate decreased with distance. The optimal distance that produced good homogeneity and maintained the highest rate of deposition was found to vary depending on the divergence of the plasma beam.