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首页> 外文期刊>Polyhedron: The International Journal for Inorganic and Organometallic Chemistry >Structural and optical evaluations of deposited nanocrystalline NiO thin films via a Ni(II)–8-hydroxyquinolate complex by the static step-by-step soft surface reaction technique for optoelectronic applications
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Structural and optical evaluations of deposited nanocrystalline NiO thin films via a Ni(II)–8-hydroxyquinolate complex by the static step-by-step soft surface reaction technique for optoelectronic applications

机译:通过静态逐步软表面反应技术,通过Ni(II)-8-羟基喹啉配合物沉积的纳米晶NiO薄膜的结构和光学评估

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摘要

The static step-by-step soft surface reaction (SS-b-SSR) technique was implemented as an efficient soft chemical methodology for the synthesis of nanocrystalline NiO thin films. The target nanocrystalline NiO was produced upon thermal annealing of deposited thin films of the Ni(II)–8-hydroxyquinolate complex, Ni(II)–(8HQ)_2. The (SS-b-SSR) technique was also used to initially produce the Ni(II)–(8HQ)_2 complex with a first step deposition of 8HQ on a glass substrate, followed by a second soft reaction step with the Ni(II) ion. The assembled thin films of nanocrystalline Ni(II)–(8HQ)_2 and NiO were characterized by elemental analysis, FT-IR, thermal gravimetric analysis (TGA), scanning electron microscopy (SEM), high resolution transmission electron microscopy (HRTEM) and X-ray diffraction (XRD). The results of XRD revealed that the diffraction peaks of NiO are well crystalline and corresponding to a face centered cubic crystal structure. The mean crystallite size (D) and dislocation density (d) were found to be 25 nm and 1.60 × 10~(-3) nm~(-2), respectively. The photoluminescence (PL) spectrum indicated a single broad peak, a near-band-edge emission in the ultraviolet region, and a relatively weak blue-green light (visible) emission at ~458.5 nm. The refractive index (n) and the absorption index (k) were calculated using spectrophotometric measurements of T(λ) and R(λ). The analysis of the spectral behavior of the absorption coefficient (α), in the absorption region revealed direct transitions and the energy gap was calculated as 3.47 eV. The temperature dependence of the resistivity ρ(T) and thermoelectric power S(T) were investigated. The photocurrent properties of the device under various illuminations were also explored and it was found that the reverse bias voltage was increased by increasing the photo-illumination intensity. The transient photocurrent results indicated that the photocurrent under illumination is higher than the dark current.
机译:静态逐步软表面反应(SS-b-SSR)技术被用作合成纳米晶体NiO薄膜的有效软化学方法。通过对Ni(II)-8-羟基喹啉配合物Ni(II)-(8HQ)_2的沉积薄膜进行热退火,可以生产目标纳米晶NiO。 (SS-b-SSR)技术还用于最初生产Ni(II)–(8HQ)_2配合物,第一步是在玻璃基板上沉积8HQ,然后是第二步与Ni(II)的软反应)离子。通过元素分析,傅立叶变换红外光谱,热重分析(TGA),扫描电子显微镜(SEM),高分辨率透射电子显微镜(HRTEM)和透射电镜对Ni(II)–(8HQ)_2和NiO纳米晶的组装薄膜进行了表征。 X射线衍射(XRD)。 XRD的结果表明,NiO的衍射峰是良好的结晶并且对应于面心立方晶体结构。平均晶粒尺寸(D)和位错密度(d)分别为25 nm和1.60×10〜(-3)nm〜(-2)。光致发光(PL)光谱显示一个宽峰,在紫外区域有一个近带边缘发射,在〜458.5 nm处有一个相对较弱的蓝绿色光(可见光)发射。使用分光光度法测量T(λ)和R(λ)来计算折射率(n)和吸收指数(k)。对吸收系数(α)在吸收区的光谱行为的分析显示出直接跃迁,并且能隙被计算为3.47 eV。研究了电阻率ρ(T)和热电功率S(T)的温度依赖性。还研究了器件在各种照明下的光电流性能,发现通过增加光照明强度可以增加反向偏置电压。瞬态光电流结果表明,光照下的光电流高于暗电流。

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