纳米晶NiO薄膜的电化学沉积及其光学性能研究

摘要

Nanocrystalline NiO thin films were deposited on FTO-coated glass substrates by a cathodic electrochemical deposition method by using Ni(NO3)2 aqueous solution as electrolyte.Crystallinity,surface morphology and optical properties of NiO thin films obtained were characterized by XRD,ultraviolet and visible light transmittance spectrum and so on.Results show that deposition of NiO is greatly affected by the deposition potential and deposition time.At optimal conditions (-0.9 V for 2-5 min),NiO thin film obtained is dense,uniform and pin-hole free in surface morphology and the transmittance of which in the visible range is as high as 85％.%以Ni(NO3)2水溶液为沉积液,采用阴极电化学沉积法在FTO导电玻璃上制备了纳米晶NiO薄膜.通过X射线衍射、紫外-可见光透过谱等手段表征薄膜结晶性、表面微观形貌以及光学特性.结果表明,沉积电位以及沉积时间均对电化学沉积法薄膜沉积过程存在重要影响.在优化条件下(沉积电压为-0.9 V、沉积时间为2～5 min),所获薄膜致密均一,无裂纹,对可见光的透过率高达85％.