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首页> 外文期刊>Physical Review, B. Condensed Matter >CUPT-TYPE ORDERING AND DOPANT EFFECT OF IN0.5GA0.5-P/GAAS USING SPECTROSCOPIC ELLIPSOMETRY
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CUPT-TYPE ORDERING AND DOPANT EFFECT OF IN0.5GA0.5-P/GAAS USING SPECTROSCOPIC ELLIPSOMETRY

机译:分光光度法测定IN0.5GA0.5-P / GAAS的尖峰型阶跃和掺杂效应

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The CuPt-type ordering and dopant effects of In0.5Ga0.5P/GaAs epitaxial layers have been studied using spectroscopic ellipsometry and transmission electron microscopy. The degree of ordering was estimated by both transmission electron diffraction and the position of the direct band edge E(0). Conventional line-shape fitting of E(1), E(1) + Delta(1), and E(0) gaps using the second derivative of pseudodielectric functions shows that the peak position of the El gap is a function of CuPt-type ordering and carrier concentration whereas the linewidth and phase depend mainly on carrier concentration. The decrease of the El gap is explained in terms of CuPt-type ordering and doping related band-gap renormalization. In contrast to the E, gap, all these line-shape parameters of the E'(0) gap depend mainly on CuPt-type ordering. Finally, we compare our data with a recent band-structure calculation. [References: 47]
机译:In0.5Ga0.5P / GaAs外延层的CuPt型有序和掺杂效应已经通过椭圆偏振光谱法和透射电子显微镜研究了。有序度通过透射电子衍射和直接带边缘E(0)的位置来估计。使用伪介电函数的二阶导数的E(1),E(1)+ Delta(1)和E(0)间隙的常规线形拟合表明,El间隙的峰值位置是CuPt型的函数有序和载流子浓度,而线宽和相位主要取决于载流子浓度。根据CuPt型有序化和掺杂相关的带隙重归一化解释了El间隙的减小。与E间隙相反,E'(0)间隙的所有这些线形参数主要取决于CuPt类型的排序。最后,我们将数据与最近的能带结构计算进行比较。 [参考:47]

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