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15th Annual BACUS Symposium on Photomask Technology and Management

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1.Application of alternating PSM to sub-quarter-micrometer technology usingi-line lithography,

机译：交替PSM在i-line光刻技术应用于四分之一微米技术中的应用，
- 作者：Hung-Eil Kim;Hyundai Electronics;Ichon-kun;Kyungiki-do;South Korea;Chang-Nam Ahn;Hyundai Electronics;Ichon-kun Kyoungki-do;South Korea;Keun-Young Kim;Hyundai Electronics;Ichon-Kun;Kyongki-do;South Korea;Ki-Ho Baik;Hyundai Electronics;Kyoungki-do;South Korea.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
2.Side-lobe suppression in halftone PSM with optical proximity correction,

机译：具有光学邻近校正功能的半色调PSM中的旁瓣抑制，
- 作者：In-Gyun Shin;Samsung Electronics Co.;Ltd.;Kheung Yongn Kyngki;South Korea;Sung-Chul Lim;Samsung Electronics Co.;Ltd.;Yongin-Gun;Kyungki-Do;South Korea;Sang-Gyun Woo;Samsung Electronics Co.;Ltd.;Yongin-gun;Kyungki-do;South Korea;Woo-Sung Han;Samsung Electronics Co.;Ltd.;Yongin-Gun;Kyungki-Do;South Korea;Young-Bum Koh;Samsung Electronics Co.;Ltd.;Yongin-Gun;Kyungki-Do;South Korea.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
3.How to improve MEBES-III Write times by improving your MEBES-III directory management discipline enabled by high-speed networking software

机译：如何通过改善高速网络软件支持的MEBES-III目录管理纪律来改善MEBES-III的写入时间
- 作者：Greg Booi;AB Networks;Inc.;Mill Valley;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
4.Manufacturing performance of the ALTA 3000 mask laser writer

机译：ALTA 3000掩模激光写入器的制造性能
- 作者：Brian J. Grenon;IBM Microelectronics;Essex Junction;VT;USA;D.C. Defibaugh;IBM Microelectronics;Essex Junction;VT;USA;Donna M. Sprout;IBM Microelectronics;Essex Junction;VT;USA;C.J. Taft;IBM Microelectronics;Essex Junction;VT;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
5.Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference

机译：生成用于将MEBES 4500系统与外部参考匹配的参考网格工件的方法
- 作者：Jim DeWitt;Intel Corp.;Santa Clara;CA;USA;Joe Watson;Intel Corp.;Santa Clara;CA;USA;Thomas P. Coleman;Etec Systems;Inc.;Hayward;CA;USA;Leonard Gasiorek;Etec Systems;Inc.;Hayward;CA;USA;Michael D. Lubin;Etec Systems;Inc.;Hayward;CA;USA;Robert J. Naber;Etec Systems;Inc.;Hayward;CA;USA;William Wang;Etec Systems;Inc.;Milpitas;CA;USA;Keith Wires;Etec Systems;Inc.;Hayward;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
6.Large-area high-quality photomasks

机译：大面积高质量光掩模
- 作者：Torbjorn Sandstrom;Micronic Laser Systems AB;Taeby;Sweden;Leif Odselius;Micronic Laser Systems AB;Taeby;Sweden.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
7.Mix-and-match lithography technology on 6-in. wafers for nanofabrication

机译：6英寸混合匹配光刻技术。纳米加工晶圆
- 作者：Shyi-Long Shy;National Nano Device Lab.;Hsinchu;Taiwan;T.S. Chao;National Nano Device Lab.;Hsinchu;Taiwan;C.H. Chu;National Nano Device Lab.;Hsinchu;Taiwan;T.F. Lei;National Nano Device Lab.;Hsinchu;Taiwan;Kazumitsu Nakamura;National Nano Device Lab.;Hsinchu;Taiwan;Wen-An Loong;National Chiao Tung Univ.;Hsinchu;Taiwan;C.Y. Chang;National Nano Device Lab.;Hsinchu;Taiwan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
8.Actual use of phase-shift mask

机译：实际使用相移掩模
- 作者：Yoshiro Yamada;Toppan Printing Co.;Ltd.;Niiza;Japan;Hiromasa Unno;Toppan Printing Co.;Ltd.;Niiza-shi;Saitama;Japan;Kazuaki Chiba;Toppan Printing Co.;Ltd.;Santa Clara;CA;USA;Eisei Karikawa;Toppan Printing Co.;Ltd.;Niiza-shi Saitama;Japan;Yasutaka Kikuchi;Toppan Printing Co.;Ltd.;Niiza-shi;Saitama;Japan;Yusuke Hattori;Toppan Printing Co.;Ltd.;Saitama;Japan;Katsuhiro Kinemura;Toppan Printing Co.;Ltd.;Niiza-shi;Saitama;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
9.Predicting mask performance by numerical simulation

机译：通过数值模拟预测面罩性能
- 作者：Qi-De Qian;Intel Corp.;Santa Clara;CA;USA;Giang T. Dao;Intel Corp.;Santa Clara;CA;USA;Pei-yang Yan;Intel Corp.;Saratoga;CA;USA;Francisco A. Leon;Intel Corp.;Santa Clara;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
10.X-ray mask fabrication techniques for micromachining

机译：用于微加工的X射线掩模制造技术
- 作者：Yuli Vladimirsky;Louisiana State Univ.;Baton Rouge;LA;USA;Olga Vladimirsky;Louisiana State Univ.;Baton Rouge;LA;USA;Volker Saile;Louisiana State Univ.;Baton Rouge;LA;USA;Kevin J. Morris;Louisiana State Univ.;Baton Rouge;LA;USA;J. Michael Klopf;Louisiana State Univ.;Baton Rouge;LA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
11.Contributions by blank vendors to critical dimension and defect errors

机译：空白供应商对关键尺寸和缺陷错误的贡献
- 作者：James Unruh;Photronics;Inc.;Dallas;TX;USA;Benjamin G. Eynon;Jr.;Photronics;Inc.;Dallas;TX;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
12.Identifying the components of mask image-size variation

机译：识别蒙版图像大小变化的成分
- 作者：Andrew D. Pond;IBM Microelectronics;Essex Junction;VT;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
13.Investigation of MEBES 4500 system composite performance

机译：MEBES 4500系统复合性能研究
- 作者：Jim DeWitt;Intel Corp.;Santa Clara;CA;USA;Joe Watson;Intel Corp.;Santa Clara;CA;USA;David Alexander;Etec Systems;Inc.;Hayward;CA;USA;Allen Cook;Etec Systems;Inc.;Hayward;CA;USA;Leonard Gasiorek;Etec Systems;Inc.;Hayward;CA;USA;Mark Mayse;Etec Systems;Inc.;Hayward;CA;USA;Robert J. Naber;Etec Systems;Inc.;Hayward;CA;USA;Wayne Phillips;Etec Systems;Inc.;Hayward;CA;USA;Charles A. Sauer;Etec Systems;Inc.;Hayward;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
14.24'x 20' precision photomasks manufacture

机译：24“ x 20”精密光掩模的生产
- 作者：Graciela R. Guel;Photronics Inc.;Colorado Springs;CO;USA;Martin Boothman;Photronics Inc.;Colorado Springs;CO;USA;Daniel R. Rector;Photronics Inc.;Colorado Springs;CO;USA;Susan M. Gasper-Wilson;Univ. of New Mexico;Albuquerque;NM;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
15.Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes

机译：亚半微米DUV晶圆工艺中激光掩模修复引起的残留物和石英损坏的影响
- 作者：Pei-yang Yan;Intel Corp.;Saratoga;CA;USA;Qi-De Qian;Intel Corp.;Santa Clara;CA;USA;Joan McCall;Intel Corp.;Santa Clara;CA;USA;Joseph C. Langston;Intel Corp.;Santa Clara;CA;USA;Yu S. Ger;Intel Corp.;Santa Clara;CA;USA;Joe S. Cho;Intel Corp.;Santa Clara;CA;USA;Robert F. Hainsey;Intel Corp.;Aloha;OR;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
16.Fabrication processes for SCALPEL mask blanks

机译：SCALPEL面膜毛坯的制造工艺
- 作者：Harold A. Huggins;ATT Bell Labs.;Murray Hill;NJ;USA;Kevin J. Bolan;ATT Bell Labs.;Murray Hill;NJ;USA;Alexander J. Liddle;ATT Bell Labs.;Murray Hill;NJ;USA;Milton Peabody;ATT Bell Labs.;Murray Hill;NJ;USA;Regine G. Tarascon;ATT Bell Labs.;Murray Hill;NJ;USA;David L. Windt;ATT Bell Labs.;Murray Hill;NJ;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
17.Good OPC where will this drive mask CD tolerance and mask grid size

机译：好的OPC，它将在哪里驱动掩膜CD容差和掩膜网格大小
- 作者：Donald J. Samuels;IBM Corp.;Yorktown Heights;NY;USA;Wilhelm Maurer;Siemens AG;Munich;Germany;Timothy R. Farrell;IBM Corp.;Fishkill;NY;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
18.Intelligent ground-rule-based inspection of OPC masks

机译：基于OPC面罩的智能基础规则检查
- 作者：Robert P. Bishop;Beltronics;Inc.;Newton;MA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
19.Low-cost photomask inspection system

机译：低成本光掩模检测系统
- 作者：Damayanti C. Gharpure;Univ. of Poona;Pune;India;Sunil K. David;Univ. of Poona;Pune;India.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
20.Advances in stencil mask technology: control of distortion in ion-projection lithography masks

机译：模板掩模技术的进展：离子投影光刻掩模的变形控制
- 作者：John C. Wolfe;Univ. of Houston;Houston;TX;USA;Alex R. Shimkunas;Nanostructures;Inc.;Santa Clara;CA;USA;John Melngailis;Univ. of Maryland/College Park;College Park;MD;USA;Hans Loeschner;Ion Microfabrication Systems GmbH;Vienna;Austria;Robert D. Mohondro;Advanced Lithography Group;Columbia;MD;USA;John N. Randall;Texas Instruments Inc.;Dallas;TX;USA.
- 会议名称：《》 | 1995年
21.Printability of opaque repairs for DUV EPSM clear defects at sub-half-micrometer design rules

机译：亚半微米设计规则的DUV EPSM不透明修补物的可印刷性可清除缺陷
- 作者：Pei-yang Yan;Intel Corp.;Saratoga;CA;USA;Joan McCall;Intel Corp.;Santa Clara;CA;USA;Robert F. Hainsey;Intel Corp.;Aloha;OR;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
22.Production performance of the EBES4 electron-beam lithography system

机译：EBES4电子束光刻系统的生产性能
- 作者：David M. Walker;Lepton;Inc.;Brookfield;CT;USA;Sheldon M. Kugelmass;Lepton;Inc.;Murray Hill;NJ;USA;K.A. Murray;Lepton;Inc.;New Providence;NJ;USA;C.M. Rose;Lepton;Inc.;New Providence;NJ;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
23.Repeatable mask metrology for next-generation lithography tools

机译：下一代光刻工具的可重复掩模计量
- 作者：Steve L. Hentschel;Nikon Precision Inc.;Belmont;CA;USA;Henry Kamberian;Rockwell Telecommunications;Belmont;CA;USA;Julius Kovatch;Rockwell Telecommunications;Belmont;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
24.Shifter slope variation effect of embedded half-tone phase-shift masks

机译：嵌入式半色调相移掩模的移位器斜率变化效应
- 作者：Jong-Wook Kye;Samsung Electronics Co.;Ltd.;Yongin-Gun;Kyungki-Do;South Korea;Seong-Yong Moon;Samsung Electronics Co.;Ltd.;Yongin-Gun;Kyungki-Do;South Korea;Sang-Gyun Woo;Samsung Electronics Co.;Ltd.;Yongin-gun;Kyungki-do;South Korea;Woo-Sung Han;Samsung Electronics Co.;Ltd.;Yongin-Gun;Kyungki-Do;South Korea;Young-Bum Koh;Samsung Electronics Co.;Ltd.;Yongin-Gun;Kyungki-Do;South Korea.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
25.Side-lobe suppression in halftone PSM with optical proximity correction

机译：具有光学邻近校正功能的半色调PSM中的旁瓣抑制
- 作者：Author(s): In-Gyun Shin Samsung Electronics Co. Ltd. Kheung Yongn Kyngki South Korea;Sung-Chul Lim Samsung Electronics Co. Ltd. Yongin-Gun Kyungki-Do South Korea;Sang-Gyun Woo Samsung Electronics Co. Ltd. Yongin-gun Kyungki-do South Korea;Woo-Sung Han Samsung Electronics Co. Ltd. Yongin-Gun Kyungki-Do South Korea;Young-Bum Koh Samsung Electronics Co. Ltd. Yongin-Gun Kyungki-Do South Korea.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
26.Deep-UV attenuated phase-shift mask for a quarter-micrometer photolithography

机译：用于四分之一微米光刻的深紫外衰减相移掩模
- 作者：Suigen Kyoh;Toshiba Corp.;Saiwai-ku Kawasaki;Japan;Hideaki Sakurai;Toshiba Corp.;Saiwai-ku;Kawasaki;Japan;Takayuki Iwamatsu;Toshiba Corp.;Saiwai-ku;Kawasaki;Japan;Iwao Higashikawa;Toshiba Corp.;Saiwai-ku;Kawasaki;Japan;Rikiya Taniguchi;Toshiba Corp.;Saiwai-ku;Kawasaki;Japan;Hidehiro Watanabe;Toshiba Corp.;Saiwai-ku;Kawasaki;Japan;Takashi Tuchiya;Toshiba Corp.;Sawai-ku;Kawasaki;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
27.Ergonomic risks in mask manufacturing and methods to combat them

机译：口罩制造中的人体工程学风险及其应对方法
- 作者：Larry Gardner;Intel Corp.;Santa Clara;CA;USA;Al Strott;Intel Corp.;Hillsboro;OR;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
28.Evaluation of commercial and experimental resist materials for use in MEBES mask making

机译：评估用于MEBES掩模制造的商业和实验抗蚀剂材料
- 作者：Charles A. Sauer;Etec Systems;Inc.;Hayward;CA;USA;Robert L. Dean;Etec Systems;Inc.;Hayward;CA;USA;Etsuya Morita;Etec Systems;Inc.;Belmont;CA;USA;Zoilo C. Tan;Etec Systems;Inc.;Cupertino;CA;USA;Bruce W. Smith;Rochester Institute of Technology;Rochester;NY;USA;Dale E. Ewbank;Rochester Institute of Technology;Rochester;NY;USA;Sid P. Duttagupta;Rochester Institute of Technology;Rochester;NY;USA;Anne Rudack;SEMATECH;Dallas;TX;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
29.Hierarchical proximity correction using CAPROX

机译：使用CAPROX的分层邻近校正
- 作者：Ulrich Hofmann;Sigma-C GmbH;Ottobrunn;Germany;Christian K. Kalus;Sigma-C GmbH;Ottobrunn;Germany;Anja Rosenbusch;Sigma-C GmbH;Ottobrunn;Germany;H.Endo;OKI Electric Ltd.;Tokyo;Hachioji-shi;Japan;Yasuki Kimura;OKI Electric Ltd.;Tokyo;Hachioji-shi;Japan;A.Endo;OKI Electric Ltd.;Tokyo;Hachioji-shi;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
30.Improved estimates of the range of errors on photomasks using measured values of skewness and kurtosis

机译：使用偏度和峰度的测量值改进对光掩模误差范围的估计
- 作者：Henry C. Hamaker;Etec Systems;Inc.;Beaverton;OR;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
31.Initial evaluation result of DNQ-novolak resist system for advanced e-beam reticle fabrication

机译：DNQ-novolak抗蚀剂系统用于高级电子束掩模版的初步评估结果
- 作者：Yasunori Yokoya;Hoya Corp.;Kitakoma-gun Yamanashi;Japan;Hideo Kobayashi;Hoya Corp.;Kitakoma-gun Yamanashi;Japan;Keishi Asakawa;Hoya Corp.;Kitakoma-gun Yamanashi;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
32.Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems

机译：优化多遍打印的使用，以最大程度地减少高级激光掩模版写入系统中的打印错误
- 作者：Henry C. Hamaker;Etec Systems;Inc.;Beaverton;OR;USA;Gary A. Burns;Etec Systems;Inc.;Beaverton;OR;USA;Peter D. Buck;Etec Systems;Inc.;Beaverton;OR;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
33.Photomask production integration of KLA STARlight 300 system

机译：KLA STARlight 300系统的光掩模生产集成
- 作者：Franklin D. Kalk;DuPont Photomasks;Inc.;Austin;TX;USA;David Mentzer;DuPont Photomasks;Inc.;Round Rock;TX;USA;Anthony Vacca;KLA Instruments;Inc.;Cedar Park;TX;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
34.Powerful inspection and metrology tool for micro- and nanofabrication

机译：强大的用于微米和纳米加工的检测和计量工具
- 作者：Shyi-Long Shy;National Chiao Tung Univ.;Hsinchu;Taiwan;T.F. Lei;National Chiao Tung Univ.;Hsinchu;Taiwan;Kazumitsu Nakamura;National Chiao Tung Univ.;Hsinchu;Taiwan;Wen-An Loong;National Chiao Tung Univ.;Hsinchu;Taiwan;C.Y. Chang;National Chiao Tung Univ.;Hsinchu;Taiwan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
35.Chromium-based attenuated embedded phase-shift photomask blanks for use in 1X lithography

机译：用于1X光刻的基于铬的衰减型嵌入式相移光掩模坯料
- 作者：Dan L. Schurz;Ultratech Stepper;San Jose;CA;USA;Elizabeth Tai;Ultratech Stepper;San Jose;CA;USA;Franklin D. Kalk;DuPont Photomasks;Inc.;Austin;TX;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
36.Inspection system qualification and integration into the mask manufacturing environment

机译：检验系统认证并整合到面罩制造环境中
- 作者：Rosanne LaVoy;Intel Corp.;San Jose;CA;USA;Ron Fujioka;Intel Corp.;San Jose;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
37.Plasma etching of chromium films in the fabrication of photomasks

机译：在光掩模制造中对铬膜的等离子蚀刻
- 作者：Thomas P. Coleman;Etec Systems;Inc.;Hayward;CA;USA;Peter D. Buck;Etec Systems;Inc.;Beaverton;OR;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
38.Resist charging in electron-beam lithography

机译：电子束光刻中的抗蚀剂充电
- 作者：W.Liu;Stanford Univ.;Stanford;CA;USA;R. Fabian W. Pease;Stanford Univ.;Stanford;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
39.Simplified rule generation for automated rules-based optical enhancement

机译：简化的规则生成，用于基于规则的自动光学增强
- 作者：Oberdan W. Otto;Trans Vector Technologies;Inc.;Camarillo;CA;USA;Joseph G. Garofalo;ATT Bell Labs.;Murray Hill;NJ;USA;Richard C. Henderson;Trans Vector Technologies;Inc.;Camarillo;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
40.Attenuated phase-shifting mask specification with modified beam illumination

机译：修正光束照明的衰减型移相掩模规范
- 作者：Ichiro Kagami;Sony Corp.;Atsugi Kanagawa;Japan;Minoru Sugawara;Sony Corp.;Atsugi-shi Kanagawa;Japan;Hiroichi Kawahira;Sony Corp.;Atsugi Kanagawa;Japan;Keisuke Tsudaka;Sony Corp.;Atsugi Kanagawa;Japan;Kiichi Ishikawa;Sony Corp.;Atsugi Kanagawa;Japan;Satoru Nozawa;Sony Corp.;Atsugi-shi Kanagawa;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
41.Current technological status of spatial-filtering method for soft defect detection

机译：软缺陷检测的空间滤波方法的技术现状
- 作者：Tsuneyuki Hagiwara;Nikon Corp.;Shinagawa-ku Tokyo;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
42.Fast EB-PEC system for 0.25-um device reticle fabrication using a variable shaped beam machine

机译：快速EB-PEC系统，用于使用可变形状光束加工机制造0.25um的掩模版
- 作者：Manabu Tomita;Sony Corp.;Atsugi-shi Kanagawa;Japan;Hidetosi Ohnuma;Sony Corp.;Atsugi-shi Kanagawa;Japan;Masaaki Koyama;Sony Corp.;Atsugi-shi Kanagawa;Japan;Hiroichi Kawahira;Sony Corp.;Atsugi Kanagawa;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
43.Fast sparse aerial-image calculation for OPC

机译：OPC的快速稀疏航拍图像计算
- 作者：Nicolas B. Cobb;Univ. of California/Berkeley;Berkeley;CA;USA;Avideh Zakhor;Univ. of California/Berkeley;Berkeley;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
44.Masks for laser ablation technology: new requirements and challenges

机译：激光烧蚀技术的面罩：新的要求和挑战
- 作者：James L. Speidell;IBM Thomas J. Watson Research Ctr.;Yorktown Heights;NY;USA;Doris Pulaski;IBM Microelectronics;Holmes;NY;USA;Rajesh S. Patel;IBM Microelectronics;Hopewell Junction;NY;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
45.Next-generation mask strategy: accuracy and mask-size survey and discussion results at PMJ '95 rump session

机译：下一代口罩策略：在PMJ '95臀部会议上的准确性和口罩尺寸调查及讨论结果
- 作者：Yoshihiro Todokoro;Matsushita Electronics Corp.;Minami-ku;Kyoto-shi;Japan;Hiroaki Morimoto;Mitsubishi Electric Corp.;Itami;Hyogo;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
46.Proximity correction for e-beam lithography

机译：电子束光刻的接近度校正
- 作者：Christie R. Marrian;Naval Research Lab.;Washington;DC;USA;S.Chang;U.S. Dept. of Defense;Washington;DC;USA;Martin C. Peckerar;Naval Research Lab.;Washington;DC;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
47.Quality assurance of dielectric masks for laser ablation technology

机译：用于激光烧蚀技术的介电掩模的质量保证
- 作者：Doris Pulaski;IBM Microelectronics;Holmes;NY;USA;Rajesh S. Patel;IBM Microelectronics;Hopewell Junction;NY;USA;James L. Speidell;IBM Thomas J. Watson Research Ctr.;Yorktown Heights;NY;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
48.Further work in optimizing PBS: is it capable of meeting specifications for 256 Mbit DRAM reticle manufacturing?

机译：优化PBS的进一步工作：是否能够满足256 Mbit DRAM掩模版制造的规格？
- 作者：Robert L. Dean;Etec Systems;Inc.;Hayward;CA;USA;Charles A. Sauer;Etec Systems;Inc.;Hayward;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
49.Investigation of GMC for CD uniformity benefits

机译：调查GMC的CD一致性好处
- 作者：Christopher P. Braun;ATT Microelectronics;Bath;PA;USA;Michael W. Stohl;ATT Microelectronics;Coopersburg;PA;USA;Anthony E. Novembre;ATT Bell Labs.;Murray Hill;NJ;USA;Frederick. R. Peiffer;ATT Microelectronics;Allentown;PA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
50.1995 mask industry quality assessment

机译：1995年口罩行业质量评估
- 作者：Chris Bishop;Intel Corp.;Santa Clara;CA;USA;Al Strott;Intel Corp.;Hillsboro;OR;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
51.Printability of laser mask repairs at deep UV

机译：激光掩模在深紫外线下的可印刷性
- 作者：James A. Reynolds;Reynolds Consulting;Sunnyvale;CA;USA;Franklin M. Schellenberg;Hewlett-Packard Co.;Austin;TX;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
52.Application of alternating PSM to sub-quarter-micrometer technology using i-line lithography

机译：i-line光刻技术将交替PSM在四分之一微米技术中的应用
- 作者：Author(s): Hung-Eil Kim Hyundai Electronics Ichon-kun Kyungiki-do South Korea;Chang-Nam Ahn Hyundai Electronics Ichon-kun Kyoungki-do South Korea;Keun-Young Kim Hyundai Electronics Ichon-Kun Kyongki-do South Korea;Ki-Ho Baik Hyundai Electronics Kyoungki-do South Korea.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
53.Integration of an advanced laser writer into a manufacturing environment

机译：将先进的激光写入器集成到制造环境中
- 作者：Gregg Inderhees;DuPont Photomasks;Inc.;Round Rock;TX;USA;Robert M. Kiefer;DuPont Photomasks;Inc.;Round Rock;TX;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
54.Quality assurance of embedded attenuated phase-shift masks

机译：嵌入式衰减相移掩模的质量保证
- 作者：Hiroyuki Miyashita;Dai Nippon Printing Co.;Ltd.;Kamifukuoka-shi Saitama;Japan;Hiroshi Fujita;Dai Nippon Printing Co.;Ltd.;Kamifukuoka-shi Saitama;Japan;Toshifumi Yokoyama;Dai Nippon Printing Co.;Ltd.;Fukuoka-shi Saitama;Japan;Naoya Hayashi;Dai Nippon Printing Co.;Ltd.;Fukuoka-shi Saitama;Japan;Hisatake Sano;Dai Nippon Printing Co.;Ltd.;Kamifukuoka-shi Saitama;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
55.Comprehensive simulation study of the photomask defects printability

机译：光掩模缺陷可印刷性的综合仿真研究
- 作者：Linard Karklin;LK Consulting;Sunnyvale;CA;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
56.Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity

机译：用于指定检查灵敏度的衰减相移掩模的缺陷可印刷性研究
- 作者：Minoru Sugawara;Sony Corp.;Atsugi-shi Kanagawa;Japan;Kiichi Ishikawa;Sony Corp.;Atsugi Kanagawa;Japan;Hiroichi Kawahira;Sony Corp.;Atsugi Kanagawa;Japan;Ichiro Kagami;Sony Corp.;Atsugi Kanagawa;Japan;Satoru Nozawa;Sony Corp.;Atsugi-shi Kanagawa;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
57.Embedded attenuating phase-shift mask: printability of defects

机译：嵌入式衰减相移掩模：缺陷的可印刷性
- 作者：Rajeev R. Singh;Intel Corp.;Austin;TX;USA;Alvina Williams;SEMATECH;Austin;TX;USA;Chi-Min Yuan;Motorola Inc.;Austin;TX;USA;Gregory P. Hughes;DuPont Photomask;Inc.;Austin;TX;USA;G.Foss;DuPont Photomask;Inc.;Austin;TX;USA;Ronald M. Martino;IBM Microelectronics;Hopewell Junction;NY;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
58.Evaluation of thin PBS resist films for improved feature linearity

机译：评估PBS抗蚀剂薄膜以改善特征线性
- 作者：Larry Davis;Photronics;Inc.;Brookfield;CT;USA;Christopher J. Goetz;Photronics;Inc.;Brookfield;CT;USA;Larry J. Watson;Apex Lithography Services;Inc.;Austin;TX;USA.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
59.Manufacturing and inspection of OPC and PSM masks

机译：OPC和PSM面罩的制造和检查
- 作者：Wolfgang Staud;Photronics;Inc.;San Jose;CA;USA;Karen Huang;Photronics;Inc.;Milpitas;CA;USA;Patricia Beard;Photronics;Inc.;Milpitas;CA;USA;Ofer Hebron;Orbot Instruments;Inc.;Sunnyvale;CA;USA;Yair Eran;Orbot Instruments Ltd.;Yavne;Israel.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年
60.Novel techniques on photomask blanks enhancement for the laser reticle writer

机译：用于激光掩模版写入器的光掩模坯料增强新技术
- 作者：Hideo Kobayashi;Hoya Corp.;Kitakoma-gun Yamanashi;Japan;Keishi Asakawa;Hoya Corp.;Kitakoma-gun Yamanashi;Japan;Yasunori Yokoya;Hoya Corp.;Kitakoma-gun Yamanashi;Japan.
- 会议名称：《15th Annual BACUS Symposium on Photomask Technology and Management》 | 1995年