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Quality assurance of embedded attenuated phase-shift masks

机译：嵌入式衰减相移掩模的质量保证

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Abstract: Abstract not available.

机译：摘要：摘要不可用。

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《15th Annual BACUS Symposium on Photomask Technology and Management》|1995年|p.614-627|共14页
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Hiroyuki Miyashita; Dai Nippon Printing Co.; Ltd.; Kamifukuoka-shi Saitama; Japan; Hiroshi Fujita; Dai Nippon Printing Co.; Ltd.; Kamifukuoka-shi Saitama; Japan; Toshifumi Yokoyama; Dai Nippon Printing Co.; Ltd.; Fukuoka-shi Saitama; Japan; Naoya Hayashi; Dai Nippon Printing Co.; Ltd.; Fukuoka-shi Saitama; Japan; Hisatake Sano; Dai Nippon Printing Co.; Ltd.; Kamifukuoka-shi Saitama; Japan.;
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中图分类无线电电子学、电信技术;
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入库时间 2022-08-26 14:01:44

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4. Quality assurance of embedded attenuated phase-shift masks [C] . Hiroyuki Miyashita, Hiroshi Fujita, Toshifumi Yokoyama, Annual Symposium on photomask technology and management . 1995

机译：嵌入的衰减相移掩模的质量保证
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