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A Voltage-Based Leakage Current Calculation Scheme and its Application to Nanoscale MOSFET and FinFET Standard-Cell Designs

机译:基于电压的漏电流计算方案及其在纳米MOSFET和FinFET标准单元设计中的应用

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摘要

Logic-level estimators of leakage currents, in nanoscale standard-cell-based designs, are relevant for the dramatic speed advantage with respect to analog SPICE-level simulation. We propose a novel logic-level leakage estimation model based on the characterization of voltages at the internal nodes of digital cells, in conjunction with the characterization of leakage currents in a single field-effect transistor (FET) device and with the input-dependent Kirchhoff current law expression of the total current in the cell topology. The voltage-based nature of the approach simplifies the inclusion of supply voltage variation/scaling impact, as well as of output voltage drop (loading effect), on leakage currents. The method has been implemented in hardware description language models of a complete cell library. Exhaustive tests report average accuracy below 1% error in 22-nm CMOS and 20-nm FinFET technologies, when compared with SPICE BSIM simulation results.
机译:在基于纳米标准单元的设计中,泄漏电流的逻辑级估计器相对于模拟SPICE级仿真具有显着的速度优势。我们基于数字单元内部节点上的电压表征,单个场效应晶体管(FET)器件中的泄漏电流表征以及与输入有关的Kirchhoff,提出了一种新颖的逻辑级泄漏估计模型电池拓扑中总电流的电流定律表达式。该方法基于电压的性质简化了电源电压变化/缩放影响以及输出电压降(负载效应)对泄漏电流的影响。该方法已经在完整单元库的硬件描述语言模型中实现。详尽的测试报告,与SPICE BSIM仿真结果相比,22nm CMOS和20nm FinFET技术的平均精度低于1%的误差。

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