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Testing of TSV-Induced Small Delay Faults for 3-D Integrated Circuits

机译:TSV引起的3-D集成电路小延迟故障的测试

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Through silicon via (TSV) is a widely used interconnect technology in 3-D integrated circuits. This paper shows that defective TSVs can induce small delay faults in surrounding logic gates. We present simulation results of TSV-induced small delay fault (TSDF) because of mechanical stress or pinhole leakage. A test technique is proposed to detect TSDF using a physical-aware fault extractor and timing-aware automatic test pattern generation. This technique requires no DfT area overhead and no direct TSV probing. Experimental results on benchmark circuits show that test coverage can be improved by 22% and 10% for stress-induced and leakage-induced TSDF, respectively. In our results, the test length overheads of both TSDFs are ${<}{5%}$.
机译:硅穿孔(TSV)是3-D集成电路中一种广泛使用的互连技术。本文表明,有缺陷的TSV可以在周围的逻辑门中引起小的延迟故障。由于机械应力或针孔泄漏,我们介绍了由TSV引起的小延迟故障(TSDF)的仿真结果。提出了一种使用物理感知的故障提取器和时序感知的自动测试模式生成来检测TSDF的测试技术。该技术不需要DfT区域开销,也不需要直接的TSV探测。在基准电路上的实验结果表明,应力引起的TSDF和泄漏引起的TSDF的测试覆盖率分别可以提高22%和10%。在我们的结果中,两个TSDF的测试长度开销均为$ {<} {5%} $。

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