首页> 外文期刊>Very Large Scale Integration (VLSI) Systems, IEEE Transactions on >Single-Ended 9T SRAM Cell for Near-Threshold Voltage Operation With Enhanced Read Performance in 22-nm FinFET Technology
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Single-Ended 9T SRAM Cell for Near-Threshold Voltage Operation With Enhanced Read Performance in 22-nm FinFET Technology

机译:具有22nm FinFET技术的增强读取性能的单端9T SRAM单元,用于近阈值电压操作

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摘要

Although near-threshold () operation is an attractive method for energy and performance-constrained applications, it suffers from problems in terms of circuit stability, particularly, for static random access memory (SRAM) cells. This brief proposes a near- 9T SRAM cell implemented in a 22-nm FinFET technology. The read buffer of the proposed cell ensures read stability by decoupling the stored node from the read bit-line and improves read performance using a one-transistor read path. Energy and standby power are reduced by eliminating the sub- leakage current in the read buffer. For accurate sensing yield estimation, a new yield-estimation method is also proposed, which considers the dynamic trip voltage. The proposed SRAM cell can achieve a minimum operating voltage of 0.3 V.
机译:尽管近阈值()操作对于能量和性能受限制的应用来说是一种有吸引力的方法,但是它在电路稳定性方面(特别是对于静态随机存取存储器(SRAM)单元)存在问题。本简介提出了一种采用22nm FinFET技术实现的接近9T的SRAM单元。所提出单元的读取缓冲器通过将存储的节点与读取位线解耦来确保读取稳定性,并使用单晶体管读取路径提高了读取性能。通过消除读取缓冲器中的子泄漏电流,可以降低能耗和待机功耗。为了进行精确的感测良率估算,还提出了一种考虑动态跳闸电压的新良率估算方法。所建议的SRAM单元可以达到0.3 V的最小工作电压。

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