軟X線多層膜鏡の形状誤差補正のための大面積イオン銃を用いたミリソグ装置の開発

摘要

We have developed an ion beam milling system enabling effective, gentle and uniform milling of EUV multilayer surface of an imaging mirror for accurate compensation of the reflection phase error. An Ar ion beam of a large 150 mm in diameter accelerated at a low 500 V to avoid surface roughening is irradiated through a template selecting the areas of milling. The Ar beam profile has a quadratic distribution within 100 mm in diameter with an ion current of 0.1 mA/cm~2 at the center (r= 0 mm) and of 40% less 0.06 mA/cm~2 at the peripheral (r = 50 mm) as estimated by trench milling depth measured by an optical surface profiler (WYKO). This was also confirmed by a new detection system composed of an electrode array. A correction mask has been designed for even millig of the selected area of the sample. The milling rate of a Mo/Si multilayer with the uniform ion beam was found to be 2 min/period.%我々の研究室ではレーザープラズマ軟X線光源を用いたrn超高分解能多元物質顕微鏡の実現を目指し，曲面の基板上のrn多層膜周期膜厚とその分布をpm（ピコメータ）で制御し，rn複数枚の多層膜反射鏡間で反射波長を精密に一致させる技術rnを開発してきた．