Quantification of surface-sensitive electron spectroscopies

摘要

Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) were introduced in late 1960s as routine tools for surface analysis. Despite a long history, both techniques are still very useful in different new areas of surface science. The number of publications involving AES or XPS well exceeds 5000 per year, and is still growing.rnThe present paper compiles recent advances in quantitative applications of both techniques. Due to the considerable volume of published material, stress is put on the determination of surface composition. Three groups of subjects are addressed here. At first, typical experimental procedures for quantitative analysis are outlined. For this purpose, we briefly review the common formalism of AES and XPS. Secondly, information is provided on the correction approach in AES and XPS, similar to electron probe microanalysis (EPMA). Next, methods for determination and sources of the correction parameters are reviewed. Finally, we discuss physical parameters needed for calculation of corrections. Much attention is devoted to the problem of determination of the differential elastic-scattering cross sections for signal electrons. This parameter is of crucial importance for describing the electron trajectories in the solid. We also approach further prospects for improved quantification of AES and XPS.