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Surface Segregation Of Aluminum Atoms On Cu-9 At.% Al(111) Studied By Auger Electron Spectroscopy And Low Energy Electron Diffraction

机译:俄歇电子能谱和低能电子衍射研究Cu-9 at。%Al(111)上铝原子的表面偏析

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Auger electron spectroscopy (AES) and low energy electron diffraction (LEED) were applied to investigate the segregation of aluminum atoms on a Cu-9 at.% Al(111) surface. We observed that the Al concentration in the top layer ranged between about 9 and 36 at.% after the sample we used was annealed at different temperatures. The phenomenon of Al atoms segregating on the surfaces was explained well by considering the diffusion length of Al atoms in bulk Cu. LEED measurements showed that (3~(1/2)×3~(1/2))R30° structures grew as the concentration of Al atoms increased. The segregation phenomena on surfaces resulted in a stable two-dimensional Cu_(67)Al_(33) alloy phase in the top layer.
机译:应用俄歇电子能谱(AES)和低能电子衍射(LEED)来研究铝原子在Cu-9 at。%Al(111)表面上的偏析。我们观察到我们使用的样品在不同温度下退火后,顶层中的Al浓度在约9至36 at。%的范围内。通过考虑Al原子在块状Cu中的扩散长度,很好地解释了Al原子在表面上偏析的现象。 LEED测量表明(3〜(1/2)×3〜(1/2))R30°结构随着Al原子浓度的增加而增长。表面上的偏析现象在顶层产生稳定的二维Cu_(67)Al_(33)合金相。

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