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Coverage dependence of glycine adsorption on the Ge(100) - 2×1 surface

机译:甘氨酸在Ge(100)-2×1表面的吸附覆盖率依赖性

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A combination of infrared spectroscopy, X-ray photoelectron spectroscopy and density functional theory has been used to investigate the adsorption behavior of glycine at the Ge(100) -2×1 surface under ultrahigh vacuum conditions. Comparison of experimental and simulated 1R spectra indicates that at 31 OK, glycine adsorbs on Ge( 100) - 2 × 1 via O-H dissociation, with some fraction of the products also forming an N dative bond to a neighboring germanium atom. O-Ge dative bonding is not observed. As coverage increases, the surface concentration of the monodentate O-H dissociated adduct increases, while that of the N dative-bonded species appears constant. XPS data support and clarify the IR findings and reveal new insights, including the presence at higher coverage of a minor product that has undergone dual O-H and N-H dissociation. These findings are supported by the calculated energy diagrams, which indicate that the reaction of a glycine molecule on the Ge(100) -2×1 surface via O-H dissociation and interdimer N dative bonding is both kinetically and thermodynamically favorable and that N-H dissociation of this adduct is feasible at room temperature given incomplete thermal accommodation along the reaction pathway.
机译:结合红外光谱,X射线光电子能谱和密度泛函理论研究了甘氨酸在超高真空条件下在Ge(100)-2×1表面的吸附行为。实验和模拟1R光谱的比较表明,在31 OK时,甘氨酸通过O-H离解而吸附在Ge(100)-2×1上,部分产物还与相邻的锗原子形成N dative键。没有观察到O-Ge固定键。随着覆盖率的增加,单齿O-H离解的加合物的表面浓度增加,而N键合键合物种的表面浓度似乎恒定。 XPS数据支持并阐明了IR的发现,并揭示了新的见解,包括经过O-H和N-H双重分解的次要产品的覆盖率更高。这些发现得到了计算得出的能量图的支持,这些能量图表明,通过OH离解和二聚体N配位键在Ge(100)-2×1表面上发生甘氨酸分子的反应在动力学和热力学上都是有利的,并且NH的解离考虑到沿反应路径的热调节不完全,加合物在室温下是可行的。

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