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Stranski-Krastanow growth of copper overlayers on the Ni(110) surface

机译:Ni(110)表面上覆铜层的Stranski-Krastanow生长

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摘要

Cu overlayer formation on the Ni(110) surface was studied using scanning tunneling microscopy (STM) in an ultrahigh vacuum. Room-temperature deposition of Cu onto a Ni(110) surface exhibited layer-by-layer growth up to 6 monolayers (MLs), followed by three-dimensional island formation, i.e., the Cu overlayer growth on the Ni(110) surface is classified as Stranski-Krastanow growth. At the initial growth stage, aniso-tropic two-dimensional islands were elongated in the dose-packed [110] direction. The nucleation of the second layer was strongly affected by the morphology of the first layer, and the second-layer islands also extended in the [110] direction. The third and further layers grew two-dimensionally. Detailed STM images showed mosaic features due to Cu and Ni alloying. Three-dimensional islands were observed for Cu deposition beyond 6 ML The (110)-oriented top surface of the islands had stripes along the [001] direction. In addition, bumps extending in the [110] direction were formed on these island surfaces, indicating threading dislocation through the island to relieve the compressive stress of the overlayers. An atomic model of the bump compatible with the STM image was proposed.
机译:在超高真空中使用扫描隧道显微镜(STM)研究了在Ni(110)表面形成的铜覆盖层。 Cu在Ni(110)表面上的室温沉积表现出逐层生长直至6个单层(MLs),然后形成三维岛状结构,即Ni(110)表面上的Cu覆盖层生长为归类为Stranski-Krastanow增长。在初始生长阶段,各向异性二维岛在剂量堆积[110]方向上拉长。第二层的形核在很大程度上受到第一层形态的影响,第二层岛也沿[110]方向延伸。第三层及其他层是二维增长的。详细的STM图像显示由于Cu和Ni合金化而产生的镶嵌特征。观察到超过6 ML的3维岛状沉积Cu。岛状(110)取向的顶表面沿[001]方向有条纹。此外,在这些岛表面上形成了沿[110]方向延伸的隆起,表明穿过岛的螺纹错位以减轻覆盖层的压缩应力。提出了与STM图像兼容的凸点的原子模型。

著录项

  • 来源
    《Surface Science》 |2012年第16期|p.1221-1226|共6页
  • 作者单位

    Department of Physical Electronics and Informatics, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi-Ku. Osaka 558-8585, Japan;

    Faculty of Liberal Arts and Sciences, Osaka Prefecture University, 1 - 1 Gakuen-cho, Naka-Ku, Sakai, Osaka 599-8531, Japan;

    Department of Physical Electronics and Informatics, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi-Ku. Osaka 558-8585, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Ni(110); copper; stranski-krastanow growth; STM; heteroepitaxial growth;

    机译:镍(110);铜;Krastanow侧向生长;STM;异质外延生长;

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