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Fabrication and characterization of CuAlO_2/4H-SiC heterostructure on 4H-SiC (0001)

机译:4H-SiC(0001)中Cualo_2 / 4H-SiC异质结构的制造与表征

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摘要

In this work, CuAlO_2 films were prepared on 4H-SiC (0001) using the sol-gel method. The surface morphology, structure and optical characteristics of the prepared films were studied. A homo-geneous distribution of fine rhombohedral crystal structural grains is observed on the 4H-SiC substrate using scanning electron microscope (SEM). The film was confirmed to consist pre-dominantly of delafossite CuAlO_2 phase and impurity spinel CuAl_2O_4 phase via X-ray diffraction (XRD). The direct optical bandgap estimated from the measured transmittance spectra is approximately 3.85eV, while the indirect bandgap is 1.78 eV. Four emission peaks are observed in the photoluminescence (PL) spectra measured at room temperature. The emission peaks around 360 nm and 380 nm are the near band edge emission (NBE) of the prepared CUAlO_2 films and the 4H-SiC substrate, respectively. The other two emission peaks around 410 nm and 470 nm arises from defects of Cu-vacancy. The fabricated p-CuAlO_2/n-4H-SiC heterojunction diode exhibits typical rectification. Additionally, the turn-on voltage and rectification ratio at ± 3 V are determined to be 1.6 V and 1.26 × 10~3, respectively. A further 7.15 × 10~9 times increase of the hole injection capacity could be acquired potentially through an analysis of the energy band structure, which suggests that high injection capacity SiC bipolar devices could be feasibly ach-ieved by utilizing CuAlO_2 as the p + emitter.
机译:在这项工作中,使用溶胶 - 凝胶法在4H-SiC(0001)上制备Cualo_2薄膜。研究了制备薄膜的表面形态,结构和光学特性。使用扫描电子显微镜(SEM)在4H-SiC衬底上观察到精细菱形晶体结构晶粒的同族族分布。确认薄膜通过X射线衍射(XRD)将Delafossite Cualo_2相和杂质尖晶石Cual_2O_4相的预先显着。从测量的透射率谱估计的直接光带隙约为3.85eV,而间接带隙是1.78eV。在室温下测量的光致发光(PL)光谱中观察到四个发射峰。在360nm和380nm左右的发射峰是制备的Cualo_2膜和4H-SiC衬底的近带边缘发射(NBE)。其他两个发射峰约为410nm和470nm的缺陷来自Cu空位的缺陷。制造的P-Cualo_2 / N-4H-SiC异质结二极管表现出典型的整流。另外,±3 V的导通电压和整流比分别为1.6 V和1.26×10〜3。可以通过对能带结构的分析来潜在地获得空穴注入容量的进一步增加7.15×10〜9倍,这表明通过利用Cualo_2作为P +发射器可以是可靠的ACH-IEV的高喷射容量SiC双极器件。

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  • 来源
    《Superlattices and microstructures》 |2021年第7期|106918.1-106918.6|共6页
  • 作者单位

    Department of Electronic Engineering Xi'an University of Technology Xi'an 710048 China Key Laboratory of Wide Bandgap Semiconductor Materials Ministry of Education Xidian University 2 South Taibai Road Xi'an 710071 PR China;

    Department of Electronic Engineering Xi'an University of Technology Xi'an 710048 China;

    Department of Electronic Engineering Xi'an University of Technology Xi'an 710048 China;

    Department of Electronic Engineering Xi'an University of Technology Xi'an 710048 China;

    Department of Electronic Engineering Xi'an University of Technology Xi'an 710048 China;

    Department of Electronic Engineering Xi'an University of Technology Xi'an 710048 China;

    School of Science Xi'an Polytechnic University Xi'an 710048 China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CuAlO_2; SiC; Thin films; Sol-gel method; Heterostructure;

    机译:Cualo_2;SIC;薄膜;溶胶 - 凝胶法;异质结构;

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