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Solution-processed blue quantum-dot light-emitting diodes based on double hole transport layers: Charge injection balance, solvent erosion control and performance improvement

机译:基于双空穴传输层的溶液处理蓝色量子点发光二极管:电荷注入平衡,溶剂侵蚀控制和性能改进

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摘要

Solution processed quantum-dot based light emitting diodes (QLEDs) usually suffer from the issues of unbalanced carrier injection (especially for blue QLEDs) and solvent erosion, which prevents these devices from reaching high performance. Here we report a simple and effective method of promoting hole injection and mitigating solvent erosion simultaneously for fabricating high-performance blue QLEDs. Poly [(9,9-dioctylfluorenyl-2,7-diyl)-co-(4,4'-(N-(p-butylphenyl))-diphenylamine)] (TFB)/Lithium bis(trifluoromethanesulfonimide) (Li-TFSI)-doped poly(9-vinlycarbazole) (PVK) bi-layers with smooth surfaces/interfaces, prepared via a solution-process by utilizing 1,4-dioxane as the solvent for PVK, were used as hole transport layers (HTLs) for improving the performance of blue QLEDs. The TFB/Li-doped PVK based QLED records 5829 cd/m~2 of maximum brightness and 5.37% of peak EQE, which represents 1.1-fold increase in brightness and ~11.5-fold increase in EQE as compared with the devices based on TFB-only HTLs. The enhanced performance for these TFB/Li-doped PVK based QLEDs can be ascribed to more efficient hole injection offered by Li-doped bilayer HTLs with smooth surfaces/interfaces and stepwise energy level alignment. The CIE 1931 color coordinates (0.15, 0.03) for these TFB/ Li-doped PVK based QLEDs are close to the National Television System Committee (NTSC) standard blue CIE coordinates, showing promise for use in next-generation full-color displays. This work provides a facile solution method of fabricating TFB/Li-doped PVK bi-layers with smooth surfaces/interfaces and proves the superiority of these TFB/Li-doped PVK bi-layered HTLs in hole transport and injection for high-performance blue QLEDs.
机译:固溶处理的基于量子点的发光二极管(QLED)通常会遇到载流子注入不平衡(尤其是蓝色QLED)和溶剂腐蚀的问题,这阻碍了这些器件达到高性能。在这里,我们报告了一种用于制造高性能蓝色QLED的同时促进空穴注入和减轻溶剂腐蚀的简单有效的方法。聚[(9,9-二辛基芴基-2,7-二基)-co-(4,4'-(N-(对丁基苯基))-二苯胺)](TFB)/双(三氟甲烷磺酰亚胺)锂(Li-TFSI使用1,4-二恶烷作为PVK的溶剂,通过溶液法制备的具有光滑表面/界面的)掺杂的聚(9-乙烯基咔唑)(PVK)双层用作空穴传输层(HTL),用于改善蓝色QLED的性能。基于TFB / Li掺杂的PVK的QLED记录了5829 cd / m〜2的最大亮度和5.37%的峰值EQE,与基于TFB的器件相比,亮度提高了1.1倍,EQE增长了约11.5倍-仅HTL。这些基于TFB / Li掺杂的PVK的QLED的增强性能归因于具有光滑表面/界面和逐步能级对准的Li掺杂双层HTL提供的更有效的空穴注入。这些基于TFB / Li掺杂的PVK的QLED的CIE 1931色坐标(0.15,0.03)接近美国国家电视系统委员会(NTSC)标准的蓝色CIE坐标,这表明有望在下一代全彩显示器中使用。这项工作为制造具有光滑表面/界面的TFB / Li掺杂PVK双层提供了一种简便的解决方法,并证明了这些TFB / Li掺杂PVK双层HTL在空穴传输和注入中对高性能蓝色QLED的优越性。 。

著录项

  • 来源
    《Superlattices and microstructures》 |2020年第4期|106460.1-106460.11|共11页
  • 作者单位

    Key Laboratory of Interface Science and Engineering in Advanced Materials of Ministry of Education Taiyuan University of Technology Taiyuan Shanxi 030024 China CAS Key Laboratory of Renewable Energy Guangzhou 510640 China Collaborative Innovation Centre for Advanced Thin-film Optoelectronic Materials and Devices in Shanxi Province Taiyuan Shanxi 030024 China;

    Key Laboratory of Interface Science and Engineering in Advanced Materials of Ministry of Education Taiyuan University of Technology Taiyuan Shanxi 030024 China Collaborative Innovation Centre for Advanced Thin-film Optoelectronic Materials and Devices in Shanxi Province Taiyuan Shanxi 030024 China College of Materials Science and Engineering Taiyuan University of Technology Taiyuan Shanxi 030024 China;

    Key Laboratory of Interface Science and Engineering in Advanced Materials of Ministry of Education Taiyuan University of Technology Taiyuan Shanxi 030024 China Collaborative Innovation Centre for Advanced Thin-film Optoelectronic Materials and Devices in Shanxi Province Taiyuan Shanxi 030024 China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Blue quantum-dot light-emitting diodes; Double hole transport layers; Solution processability; Solvent erosion; Charge injection; Lithium salt doped hole transport layer;

    机译:蓝色量子点发光二极管;双孔传输层;解决方案的可处理性;溶剂侵蚀;电荷注入;锂盐掺杂空穴传输层;

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