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Enhancing responsivity and detectivity in broadband UV-VIS photodetector by ex-situ UV-ozone annealing technique

机译:通过异位紫外臭氧退火技术提高宽带紫外可见光探测器的响应度和探测率

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摘要

In the present study, we fabricated an Ultraviolet-visible (UV-Vis) photodetector by radio frequency (RF) -sputtering ZnMgO thin films on an n-type <001> Si substrate and studied the effect of UV-Ozone annealing, which has been proposed as a simple and low-cost post-growth strategy to improve its optical detection capability. The crystalline quality of the ZnMgO thin films was studied through high-resolution X-ray diffraction measurements, which revealed the dominant ZnMgO <002> peak at around 34.64° and 34.66° for the as-deposited and UV-Ozone annealed samples, respectively. The detector fabricated using the as-deposited ZnMgO thin film exhibited a photoresponsivity of 98 A/W, peak detectivity of 2.82 × 10~(13) Jones and noise-equivalent power of 7.6 × 10(-13) W/√Hz for 370 nm incident light. Moreover, a high photoresponsivity of 24.4 A/W was obtained in the visible region up to 600 nm. After UV-Ozone annealing for 70min, responsivity and detectivity improved remarkably to 199 A/W and 3.69 × 10~(13) Jones, respectively, and noise-equivalent power reduced to 5.4×10~(-13) W/√Hz. Furthermore, the UV-Ozone annealed photodetector exhibited good switching behavior with rise and fall times of 45.5 and 76.0 ms, respectively.
机译:在本研究中,我们通过在n型<001> Si衬底上进行射频(RF)溅射ZnMgO薄膜制造了紫外可见(UV-Vis)光电探测器,并研究了UV-臭氧退火的效果,提出了一种简单且低成本的后生长策略,以提高其光学检测能力。通过高分辨率X射线衍射测量研究了ZnMgO薄膜的晶体质量,该结果显示了沉积后的样品和UV-臭氧退火样品的主要ZnMgO <002>峰分别在34.64°和34.66°处。使用沉积的ZnMgO薄膜制成的检测器在370的条件下显示出98 A / W的光响应度,2.82×10〜(13)Jones的峰值检波率和7.6×10(-13)W /√Hz的噪声等效功率nm入射光。此外,在高达600 nm的可见光区获得了24.4 A / W的高光响应性。 UV-臭氧退火70min后,响应度和探测率分别显着提高到199 A / W和3.69×10〜(13)Jones,等效噪声功率降低到5.4×10〜(-13)W /√Hz。此外,紫外线臭氧退火光电探测器表现出良好的开关性能,分别具有45.5 ms和76.0 ms的上升和下降时间。

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