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Coexistence of doping and strain to tune electronic and optical properties of GaN monolayer

机译:掺杂和应变共存以调整GaN单层的电子和光学性能

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GaN monolayer is a prospective two-dimensional (2D) graphene-like material due to its excellent physical and chemical properties. Band gap engineering plays a crucial role for extending potential applications of GaN-based optoelectronic devices. We performed first-principles calculations to study the structural, electronic and optical properties of GaN monolayers by Al and In atoms doping with different concentrations. We found that Al atom doping can increase the band gap and result in the blue-shift with the increase of doping concentration, while In atom doping presents the opposite results. However, the band gap characteristics remains indirect which is unfavourable for the optical transition and solar energy conversion. Next, biaxial strains within magnitude range of -10% to 13% are applied in Al and In-doped GaN monolayers. Coexistence of doping and strain to tune electronic and optical properties of GaN monolayer are systematically studied for the first time. The results show the band gap increases at first then decreases under compressive strain and decreases monotonically under tensile strain. Moreover, the band gap characteristics changes from indirect to direct in the certain compressive strain. For the optical property modification, compressive strain can cause blue-shift in the whole energy range, while tensile strain can result in red-shift in the visible energy range and blue-shift at first then red-shift in the ultraviolet energy range. Our results confirm coexistence of doping and strain induced in GaN monolayer is an effective method in band gap engineering for the applications in tunable nano-optoelectronic devices.
机译:GaN单层由于其出色的物理和化学特性,是一种预期的二维(2D)石墨烯状材料。带隙工程对扩展GaN基光电器件的潜在应用起着至关重要的作用。我们进行了第一性原理计算,以研究不同浓度的Al和In原子掺杂对GaN单层的结构,电子和光学性质的影响。我们发现,Al原子掺杂会增加带隙并随着掺杂浓度的增加而导致蓝移,而In原子掺杂则呈现相反的结果。然而,带隙特性仍然是间接的,这对于光跃迁和太阳能转换是不利的。接下来,将在-10%至13%范围内的双轴应变施加到Al和In掺杂的GaN单层中。首次系统地研究了掺杂和应变的共存关系,以调节GaN单层的电子和光学性能。结果表明,带隙首先增加,然后在压缩应变下减小,在拉伸应变下单调减小。此外,带隙特性在一定的压缩应变下从间接改变为直接。对于光学性质的改变,压缩应变可导致整个能量范围内的蓝移,而拉伸应变可导致可见能量范围内的红移,首先导致蓝移,然后导致紫外线能量范围内的红移。我们的结果证实,在GaN单层中掺杂和应变共存是一种在带隙工程中用于可调谐纳米光电器件的有效方法。

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