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Interface analysis of indium antimonide and passive layer in infrared detector and presenting a new structure to improve dark current

机译:红外探测器中锑化铟与钝化层的界面分析并提出了改善暗电流的新结构

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In this paper, we have investigated and simulated the interface between indium antimonide and the passive layer in an infrared detector. One of the most important problems in this detector is its large dark current. We have explained the factors affecting the dark current and examined their effects using numerical analysis. One of the most important and influential factors in this process is the presence of defects in oxide. We have investigated the defect in the SiO2 trap. The impact of acceptor and donor traps, such as density and energy levels has been investigated, and then the defects of constant positive and negative steady-state charges as important factors in the current have been analyzed. We examined the darkness current and finally tried to improve it with a proposed structure. The dark current for a 0.5 V reverse bias was decreased from 2.07 mA/mu m(2) to 0.504 mA/mu m(2). (C) 2018 Elsevier Ltd. All rights reserved.
机译:在本文中,我们研究并模拟了红外探测器中锑化铟与钝化层之间的界面。该探测器最重要的问题之一是其暗电流很大。我们已经解释了影响暗电流的因素,并使用数值分析检查了它们的影响。此过程中最重要和最有影响力的因素之一是氧化物中存在缺陷。我们已经研究了SiO 2阱中的缺陷。研究了受主陷阱和施主陷阱的影响,例如密度和能级,然后分析了恒定正负负稳态电荷作为电流中重要因素的缺陷。我们检查了暗电流,并最终尝试通过提出的结构对其进行改进。 0.5 V反向偏置的暗电流从2.07 mA /μm(2)降低到0.504 mA /μm(2)。 (C)2018 Elsevier Ltd.保留所有权利。

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