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Optimization of two-dimensional electron gases and Ⅰ-Ⅴ characteristics for AlGaN/GaN HEMT devices

机译:AlGaN / GaN HEMT器件的二维电子气及Ⅰ-Ⅴ特性的优化

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In this paper, we take account of the spontaneous and piezoelectric polarization effect at the heterointerface in the AlGaN/GaN HEMT device, and one-dimensional Schroedinger-Poisson equations are solved self-consistently using a nonuniform mesh; using our findings, the AlGaN/GaN heterostructure conduction band and the two-dimensional electron gas (2DEG) density are investigated. The dependences of the 2DEG characteristics on the Al fraction, the thickness of each layer, the donor concentration and the gate voltage are investigated through simulation. The output characteristics are simulated using a quasi-2D model; a saturation voltage and threshold voltage are also shown. The influence of the spacer layer width on the 2DEG density is calculated for the first time. An explanation and analyses are given.
机译:在本文中,我们考虑了AlGaN / GaN HEMT器件中异质界面处的自发极化和压电极化效应,并使用非均匀网格自洽求解了一维Schroedinger-Poisson方程。利用我们的发现,研究了AlGaN / GaN异质结构导带和二维电子气(2DEG)密度。通过仿真研究了2DEG特性对Al含量,每一层厚度,施主浓度和栅极电压的依赖性。使用准二维模型模拟输出特性;还显示了饱和电压和阈值电压。第一次计算间隔层宽度对2DEG密度的影响。给出了解释和分析。

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