首页> 外文期刊>Superlattices and microstructures >Ion Damage During Preparation Of Nanostructures In Magnetite By Means Of Focused Ion-beam (fib) Milling
【24h】

Ion Damage During Preparation Of Nanostructures In Magnetite By Means Of Focused Ion-beam (fib) Milling

机译:聚焦离子束铣削制备磁铁矿纳米结构过程中的离子损伤

获取原文
获取原文并翻译 | 示例

摘要

Nanostructures are prepared into magnetite (Fe_3O_4) thin films on (001) MgO substrates by means of focused ion-beam (FIB) milling. The resulting ion damage is analyzed using electron backscatter diffraction (EBSD), enabling the determination of crystal orientation with a spatial resolution of about 40 nm. Depending on the ion currents and radiation dose applied during the FIB milling, different types of damage are observed. At high ion currents, an entire ring area around the nanostructure is affected by the ion beam. The EBSD analysis reveals that new, small grains with a different orientation pattern are created within the ring area. At small ion currents, proper nanostructures can be created with only minimal damage to the remainder of the film.
机译:通过聚焦离子束(FIB)铣削将纳米结构制成(001)MgO衬底上的磁铁矿(Fe_3O_4)薄膜。使用电子背散射衍射(EBSD)分析产生的离子损伤,从而能够以约40 nm的空间分辨率确定晶体取向。根据FIB研磨过程中施加的离子电流和辐射剂量,会观察到不同类型的损坏。在高离子电流下,纳米结构周围的整个环区域都受到离子束的影响。 EBSD分析表明,在环形区域内产生了具有不同取向模式的新小晶粒。在较小的离子流下,可以形成适当的纳米结构,而对膜的其余部分的损害最小。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号