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Structural and optical properties of ZnO thin films on (111) CaF_2 substrates grown by magnetron sputtering

机译:磁控溅射在(111)CaF_2衬底上ZnO薄膜的结构和光学性质

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ZnO thin films were grown on (111) CaF_2 substrates by magnetron sputtering at room temperature. Structural and optical properties of the ZnO thin films were studied. XRD analysis showed that the ZnO thin firms had the (002) preferential orientation. The transmittance of ZnO thin films was over 80% in the visible range. The optical band gap of the ZnO thin films was 3.26 eV. The optical constants (n, k) of the ZnO thin films in the wavelength range 300-1000 nm were obtained by infrared spectroscopic ellipsometry measurement. PL spectra of ZnO thin films showed strong UV near-band-edge emission peak at 376.5 nm and weak visible red emission at 643.49 nm using He-Cd laser as the light source, using a synchrotron radiation light source PL spectra showed three emission peak at 320 nm, 410 nm and 542 nm respectively.
机译:在室温下通过磁控溅射在(111)CaF_2衬底上生长ZnO薄膜。研究了ZnO薄膜的结构和光学性质。 XRD分析表明,ZnO薄膜公司具有(002)优先取向。 ZnO薄膜的透射率在可见光范围内超过80%。 ZnO薄膜的光学带隙为3.26eV。 ZnO薄膜在300-1000nm波长范围内的光学常数(n,k)通过红外光谱椭圆偏振法测量获得。 ZnO薄膜的PL光谱在He-Cd激光器作为光源的情况下在376.5 nm处具有较强的UV近带边缘发射峰,在643.49 nm处具有较弱的可见红光发射,在同步辐射光源下PL光谱显示在36.5 nm处有三个发射峰分别为320 nm,410 nm和542 nm。

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