Structural and Optical properties of ZnO thin films grown on various substrates by RF magnetron sputtering

摘要

ZnO thin films were deposited on glass, quartz and silicon substrates under the same growth condition by r.f. magnetron sputtering technique using a high purity (99.99%) ZnO target of 2-in. diameter and 3 mm thickness in an Argon atmosphere with sputtering power of 50W and sputtering pressure of 2x10~(-2) Torr. A systematic study has been made of the influence of substrate on the film structural properties. Crystalline properties of ZnO films as a function of deposited substrate were investigated using X-ray diffraction. XRD analysis revealed that the deposited films were polycrystalline in nature with strong preferential orientation of grains along the c-axis. The micro structural parameters, such as the lattice constant, crystallite size, stress and strain are calculated. The effect of substrate on the deposited films was discussed. All the films present a high transmittance of above 90% in the wavelength range of the visible spectrum and sharp absorption edge near 380 nm.