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First-principles study on the structural stability and electronic properties of AlN/GaN heterostructure nanoribbons

机译:AlN / GaN异质结构纳米带的结构稳定性和电子性能的第一性原理研究

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摘要

Using density function theory (DFT) calculations, we performed a detailed investigation of the structural stability and electronic properties of AlN/GaN heterostructure nanoribbons. The results demonstrate that the band gap for all these nanoribbons varies inversely with an increase in GaN content. The charge density for N, H, Ga and Al atoms decrease successively because of the successively decreasing electronegativity of 3.04, 2.1, 1.81 and 1.61. The edge and interface states play an important role in the charge distribution of VBM. These results are very helpful for understanding heterostructure nanoribbons and their potential utilization in future optoelectronic devices.
机译:使用密度泛函理论(DFT)计算,我们对AlN / GaN异质结构纳米带的结构稳定性和电子性能进行了详细的研究。结果表明,所有这些纳米带的带隙与GaN含量的增加成反比。 N,H,Ga和Al原子的电荷密度连续降低,这是因为电负性依次降低,分别为3.04、2.1、1.81和1.61。边缘和界面状态在VBM的电荷分布中起着重要作用。这些结果对于理解异质结构纳米带及其在未来光电器件中的潜在利用非常有帮助。

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