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N-structure based on InAs/AlSb/GaSb superlattice photodetectors

机译:基于InAs / AlSb / GaSb超晶格光电探测器的N结构

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We have studied the theoretical and experimental properties of InAs/AlSb/GaSb based type-Ⅱ superlattice (T2SL) pin photodetector called N-structure. Electronic properties of the superlattice such as HH-LH splitting energies was investigated using first principles calculations taking into account InSb and AlAs as possible interface transition alloys between AlSb/InAs layers and individual layer thicknesses of GaSb and InAs. T2SL N-structure was optimized to operate as a MWIR detector based on these theoretical approaches tailoring the band gap and HH-LH splitting energies with InSb transition layers between InAs/AlSb interfaces. Experimental results show that AlSb layers in the structure act as carrier blocking barriers reducing the dark current. Dark current density and R_0A product at 125 K were obtained as 1.8 × 10~(-6)A cm~(-2) and 800 Ω cm~2 at zero bias, respectively. The specific detectivity was measured as 3 × 10~(12) Jones with cut-off wavelengths of 4.3 μm at 79 K reaching to 2 × 10~9 Jones and 4.5 μm at 255 K.
机译:我们研究了基于InAs / AlSb / GaSb的N型Ⅱ型超晶格(T2SL)引脚光电探测器的理论和实验特性。使用第一原理计算方法研究了超晶格的电子特性,例如HH-LH分裂能,并考虑了InSb和AlAs作为AlSb / InAs层之间的界面过渡合金以及GaSb和InAs的各个层厚度的可能。基于这些理论方法,利用InAs / AlSb界面之间的InSb过渡层定制带隙和HH-LH分裂能,优化了T2SL N结构以用作MWIR检测器。实验结果表明,结构中的AlSb层充当载流子阻挡势垒,从而降低了暗电流。在零偏压下,暗电流密度和125 K下的R_0A积分别为1.8×10〜(-6)A cm〜(-2)和800Ωcm〜2。特定的检测灵敏度为3×10〜(12)Jones,截止波长在79 K时为4.3μm,在255 K时达到2×10〜9 Jones和4.5μm。

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