Ferroelectric Schottky barrier tunnel FET with gate-drain underlap: Proposal and investigation

摘要

In this paper, for the first time, a novel ferroelectric schottky barrier tunnel FET (Fe SB-TFET) is proposed and investigated. The Fe SB-TFET consists of ferroelectric gate stack with highly doped pocket at the source/drain and channel interface. In addition, for the suppression of ambipolar leakage current (I_(AMB)), gate-drain underlap is employed. By using ferroelectric gate stack, we effectively amplified the applied gate voltage to enhance electric field for the reduction of tunneling barrier width at the source side schottky barrier. As a result, the increased tunneling probability improves the device performance in terms of high I_(ON). high W_(OFF) ratio, reduced I_(AMB) and low subthreshold swing (SS) as compared to the conventional SB-TFET having double pocket We also investigate the influence of highly doped pocket (HDP) doping concentration and length on the device performance.