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首页> 外文期刊>Superlattices and microstructures >Emission wavelength red-shift by using 'semi-bulk' InGaN buffer layer in InGaN/InGaN multiple-quantum-well
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Emission wavelength red-shift by using 'semi-bulk' InGaN buffer layer in InGaN/InGaN multiple-quantum-well

机译:通过在InGaN / InGaN多量子阱中使用“半体” InGaN缓冲层来发射波长红移

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摘要

We report an elongation of emission wavelength by inserting a ~70 nm thick high quality semi-bulk (SB) In_yGa_(1-y)N buffer layer underneath the In_xGa_(1-x)N/In_yGa_(1-y)N (x > y) multi-quantum-well (MQW).While the MQW structure without the InGaN SB buffer is fully strained on the n-GaN template, the MOW structure with the buffer has ~15% relaxation. This small relaxation along with slight compositional pulling induced well thickness increase of MQW is believed to be the reason for the red-shift of emission wavelength. In addition, the SB InGaN buffer acts as an electron reservoir and also helps to reduce the Quantum Confined Stark Effect (QCSE) and thus increase the emission intensity. In this way, by avoiding fully relaxed buffer induced material degradation, a longer emission wavelength can be achieved by just using InGaN SB buffer while keeping all other growth conditions the same as the reference structure. Thus, a reasonably thick fully strained or very little relaxed InGaN buffer, which is realized by "semi-bulk" approach to maintain good InGaN material quality, can be beneficial for realizing LEDs, grown on top of this buffer, emitting in the blue to cyan to green regime without using excess indium (In).
机译:我们通过在In_xGa_(1-x)N / In_yGa_(1-y)N(x下)插入〜70 nm厚的高质量半本体(SB)In_yGa_(1-y)N缓冲层来报告发射波长的延长> y)多量子阱(MQW)。尽管没有InGaN SB缓冲的MQW结构在n-GaN模板上完全应变,但具有缓冲的MOW结构具有〜15%的弛豫率。这种小的松弛以及轻微的成分拉动引起的MQW阱厚度的增加被认为是发射波长红移的原因。此外,SB InGaN缓冲液还可以用作电子储存器,还有助于减少量子限制的斯塔克效应(QCSE),从而提高发射强度。这样,通过避免完全放松的缓冲材料诱发的降解,仅使用InGaN SB缓冲就可以实现更长的发射波长,同时保持所有其他生长条件与参考结构相同。因此,通过“半批量”方法实现的,以保持良好的InGaN材料质量的方式实现的合理厚度的完全应变或几乎不松弛的InGaN缓冲液,对于实现在此缓冲液顶部生长的,以蓝色发光的LED的实现,可能是有益的。从青色到绿色,而不使用过量的铟(In)。

著录项

  • 来源
    《Superlattices and microstructures》 |2017年第12期|279-286|共8页
  • 作者单位

    School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, 30332, GA, USA,Georgia Tech-CNRS, UMI 2958, 57070, Metz, France,CEA-LETI, Minatec Campus, F-38054, Grenoble, France;

    Georgia Tech-CNRS, UMI 2958, 57070, Metz, France;

    Georgia Tech-CNRS, UMI 2958, 57070, Metz, France;

    Georgia Tech-CNRS, UMI 2958, 57070, Metz, France;

    CEA-LETI, Minatec Campus, F-38054, Grenoble, France;

    CEA-LETI, Minatec Campus, F-38054, Grenoble, France;

    Laboratory for Photonics and Nanostructures, CNRS, Route de Nozay, 91460, Marcoussis, France;

    Georgia Tech-CNRS, UMI 2958, 57070, Metz, France,LMOPS, University of Lorraine, EA4423, 57070, Metz, France;

    School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, 30332, GA, USA,Georgia Tech-CNRS, UMI 2958, 57070, Metz, France;

    School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, 30332, GA, USA,Georgia Tech-CNRS, UMI 2958, 57070, Metz, France;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    InGaN multi-quantum-well; InGaN buffer; LED; MOVPE; Green-gap;

    机译:InGaN多量子阱;InGaN缓冲层发光二极管;MOVPE;绿间隙;

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