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Al embedded MgO barrier MTJ: A first principle study for application in fast and compact STT-MRAMs

机译:Al嵌入式MgO势垒MTJ:在快速紧凑的STT-MRAM中应用的第一个原理研究

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The first principle comparative study of a novel single Al sheet embedded MgO and pure MgO barrier having Fe electrodes magnetic tunnel junction has been presented. Al embedded MgO is reported to provide enhanced spin polarised tunnelling current due to increase of spin-polarized density of states at Fermi energy in the barrier region. This novel MTJ provides a current density and resistance area (RA) product of 94.497 × 10~7 A/cm~2 and 0.105 Ω - μm~2 respectively. With such a low RA product; it allows higher deriving current due to which switching time of magnetization reversalreduces without inducing barrier related breakdowns in non-volatile magnetic random access memories. The low RA product and high current density of the proposed MTJ may have possible applications in integration with existing MOS circuits.
机译:提出了一种新型的单片铝箔嵌入的MgO和具有Fe电极磁隧道结的纯MgO势垒的第一原理比较研究。据报道,由于势垒区费米能量处的自旋极化态密度增加,Al嵌入的MgO可提供增强的自旋极化隧穿电流。这种新型MTJ的电流密度和电阻面积(RA)乘积分别为94.497×10〜7 A / cm〜2和0.105Ω-μm〜2。具有如此低的RA产品;由于在不引起非易失性磁性随机存取存储器中与势垒相关的击穿的情况下,磁化的切换时间减少,因此它允许更高的导通电流。提出的MTJ的低RA乘积和高电流密度可能与现有MOS电路集成在一起具有可能的应用。

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