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首页> 外文期刊>Sensors and materials >Fabrication of Ultrasonic Transducers Using Epitaxial Pb(Zr,Ti)O_3 Thin Films on Epitaxial γ-Al_2O_3/Si Substrates for Smart Sensors
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Fabrication of Ultrasonic Transducers Using Epitaxial Pb(Zr,Ti)O_3 Thin Films on Epitaxial γ-Al_2O_3/Si Substrates for Smart Sensors

机译:使用外延γ-Al_2O_3/ Si衬底上的外延Pb(Zr,Ti)O_3薄膜制造智能传感器的超声换能器

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摘要

Ultrasonic transducers using epitaxial Pb(Zr,Ti)O_3 (PZT) thin films on epitaxial γ-Al_2O_3/Si substrates were successfully fabricated for the first time. The characteristics of PZT thin films on the γ-Al_2O_3/Si substrates were investigated. 240-nm-thick PZT films with various compositions were formed by the conventional sol-gel method. All PZT films were epitaxially grown on the substrates and exhibited ferroelectric and piezoelectric characteristics. Ultrasonic transducers were fabricated on the epitaxial γ-Al_2O_3(001)/ Si(001) substrates with transducer element of 1 mm square. The transmission and reception characteristics of the ultrasonic transducers were observed in water by a hydorophone. Fabricated transducers can transmit and receive an ultrasonic wave with frequency of 2.5 MHz at distances of 15 and 20 mm. From these results, ultrasonic transducers with the epitaxial PZT/Pt/γ-Al_2O_3/Si structure can be applied to Si monolithic ultrasonic smart sensors.
机译:首次成功地在外延γ-Al_2O_3/ Si衬底上制备了采用外延Pb(Zr,Ti)O_3(PZT)薄膜的超声换能器。研究了γ-Al_2O_3/ Si衬底上PZT薄膜的特性。通过常规的溶胶-凝胶法形成具有各种组成的240nm厚的PZT膜。所有PZT薄膜均外延生长在基板上,并表现出铁电和压电特性。在外延γ-Al_2O_3(001)/ Si(001)衬底上制造了超声换能器,换能器元件的面积为1平方毫米。超声换能器在水中观察到超声换能器的发射和接收特性。预制的换能器可以在15和20毫米的距离处发射和接收2.5 MHz频率的超声波。根据这些结果,可以将具有外延PZT / Pt /γ-Al_2O_3/ Si结构的超声换能器应用于Si单块超声智能传感器。

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