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Photoluminescence of monolayer to submonolayer thick Ge_(1-x)C_z on si(001)

机译:Si(001)上单层至亚单层厚Ge_(1-x)C_z的光致发光

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摘要

A detailed photoluminescence (PL) study elucidates the epitaxial limits for nominally pure and optically active Ge_(1-z)C_z layers on Si(001) substrates. The C content is varied from z = 6/100 to z = 100/100 and the layer thicknesses are changed from 0.05 monolayers (ML) to 3 ML. With increasing C fraction the thickness for which the PL signal can be detected gradually decreases. Excitation dependent PL experiments reveal a type I band edge alignment for z ≥ 29/100 and a type II alignment for z ≤ 12/100.
机译:详细的光致发光(PL)研究阐明了Si(001)衬底上名义上纯净且具有光学活性的Ge_(1-z)C_z层的外延限制。 C含量从z = 6/100变化到z = 100/100,并且层厚度从0.05单层(ML)变化到3ML。随着C分数的增加,可以检测到PL信号的厚度逐渐减小。依赖于激发的PL实验表明,对于z≥29/100,I型带边缘对齐;对于z≤12/100,II型带边缘对齐。

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