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Large band gap bowing of MBE-grown Ge_(1-x)C_x/Si(001) layers

机译:MBE-种植GE_(1-X)C_X / SI(001)层的大带隙屈服

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A GeC epilayer is one of the candidates for the light emitting devices, which can be integrated on Si(001) substrate. The Ge_(1-x)C_x epilayer with a substitutional C content of 0.04 ≤ x ≤ 0.11 is expected to have a direct-transition band structure. However, there is no crystallographically stable GeC alloy in the phase diagram, and extremely low solubility of C atoms in bulk Ge (10~8 atom/cm~3 in equilibrium) hinders from realizing high C-content and good-crystalline GeC epilayers. There have been several reports on GeC epitaxial growth by molecular beam epitaxy (MBE) or ultra-high vacuum chemical vapor deposition (UHV-CVD). However, the optical properties and band structure of GeC epilayers have scarcely investigated. In this work, the band gap energy Eg of GeC epilayer is evaluated by Fourier transformation infrared spectroscopy (FT-IR).
机译:GEC ePilayer是发光器件的候选者之一,其可以集成在Si(001)衬底上。具有0.04≤x≤0.11的取代C含量的Ge_(1-x)C_x癫痫仪具有直接转换带结构。然而,在相图中没有晶形上稳定的GEC合金,并且在散装Ge(10〜8原子/ cm〜3中的均衡)中的C原子的极低溶解度从实现高C含量和良好结晶的GEC外膜。通过分子束外延(MBE)或超高真空化学气相沉积(UHV-CVD)已经有几个关于GEC外延生长的报道。然而,GEC脱壁的光学性质和带结构几乎没有研究。在这项工作中,通过傅里叶变换红外光谱(FT-IR)评估GEC外膜的带隙能量。

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