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Field-induced charge accumulation in V-groove quantum wires

机译:V槽量子线中的场致电荷积累

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摘要

Inducing charge into V-groove quantum wires via a field effect from a back gate is investigated by solving the Laplace and Poisson equations analytically, using a sequence of three conformal mapping transformations. These solutions show that the V-groove geometry is much more effective than the corresponding planar geometry. Induced charge densities of order 10~8 m~-1 are well within present growth and processing capabilities and offer the prospect of clean, high-conductivity devices without the need for modulation doping.
机译:通过使用三个共形映射变换的序列,通过解析求解拉普拉斯和泊松方程,研究了通过后门的场效应将电荷引入V型槽量子线的方法。这些解决方案表明,V形槽的几何形状比相应的平面几何形状有效得多。感应电荷密度约为10〜8 m〜-1,在目前的增长和处理能力范围内,并提供了无需调制掺杂即可提供清洁,高电导率器件的前景。

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