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Temperature-dependent barrier characteristics of Ag/p-SnSe Schottky diodes based on I-V-T measurements

机译:基于I-V-T测量的Ag / p-SnSe肖特基二极管的温度相关势垒特性

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The current-voltage (Ⅰ―Ⅴ) characteristics of Ag Schottky contacts on a Bridgman-Stockbarger grown p-type SnSe layered semiconducting material have been measured over the temperature range of 80-350 K. Their analysis based on the thermionic emission (TE) theory has revealed an abnormal decrease of zero-bias barrier height and increase of ideality factor at lower temperatures. This behaviour has been interpreted on the basis of the assumption of a Gaussian distribution of barrier heights due to barrier height inhomogeneities that prevail at the interface. The inhomogeneities are_ considered to have Gaussian distribution with a mean barrier height of Φ_(b0) = 0.610 eV and standard deviation of σ_(s0) = 0.075 V at zero-bias. Furthermore, the mean barrier height and the Richardson constant values were obtained by means of the modified Richardson plot, ln(I_0/ T~2) — (q~2σ_(s0)~2/2k~2T~2)versus 1000/T, as 0.603 eV and 7.72 A K~(-2) cm~(-2) respectively, of which latter is close to its theoretical value of 18 A K~(-2) cm~(-2) used for the determination of the zero-bias barrier height. Hence, it has been concluded that the temperature dependence of the Ⅰ―Ⅴ characteristics of the Schottky barrier on p-type SnSe can be successfully explained on the basis of TE mechanism with Gaussian distribution of the barrier heights.
机译:在80-350 K的温度范围内,测量了Bridgman-Stockbarger生长的p型SnSe层状半导体材料上的Ag肖特基接触的电流-电压(Ⅰ-Ⅴ)特性。基于热电子发射(TE)进行了分析。理论已经揭示了零偏势垒高度的异常降低以及在较低温度下理想因子的增加。已经基于在界面处普遍存在的势垒高度不均匀性而假定势垒高度的高斯分布的假设来解释了此行为。不均匀性被认为具有高斯分布,其零势垒的平均势垒高度为Φ_(b0)= 0.610 eV,标准偏差为σ_(s0)= 0.075V。此外,通过修正的Richardson图获得了平均势垒高度和Richardson常数值,ln(I_0 / T〜2)-(q〜2σ_(s0)〜2 / 2k〜2T〜2)对1000 / T分别为0.603 eV和7.72 AK〜(-2)cm〜(-2),后者接近于用于确定零的理论值18 AK〜(-2)cm〜(-2)。偏置势垒高度。因此,可以得出结论,基于TE机理和势垒高度的高斯分布,可以成功地解释肖特基势垒Ⅰ〜Ⅴ特性对p型SnSe的温度依赖性。

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