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Electrical transport characteristics of Pd/V/N-InP Schottky diode from I-V-T and C-V-T measurements

机译:从I-V-T和C-V-T测量得出Pd / V / N-InP肖特基二极管的电传输特性

摘要

The temperature dependence of current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the Pd/V contacts on undoped n-type InP Schottky barrier diodes (SBDs) have been systematically investigated in the temperature range of 200-400 K. The transition metal palladium (Pd) is used as a second contact layer because it has high work function, it reacts with InP at low temperatures and improved contact morphology. The ideality factor (n) and zero-bias barrier height are found to be strongly temperature dependent and while the zero-bias barrier height Φbo (I-V) increases, the ideality factor n decreases with increasing temperature. The experimental values of BH and n for the devices are calculated as 0.48 eV (I-V), 0.85 eV (C-V) and 4.87 at 200 K, 0.65 eV (I-V), 0.69 (C-V) eV and 1.58 at 400 K respectively. The I-V characteristics are analyzed on the basis of thermionic emission (TE) theory and the assumption of Gaussian distribution of barrier heights due to barrier inhomogeneities that prevail at the metal-semiconductor interface. The zero-bias barrier height Φbo versus 1/2kT plot has been drawn to obtain the evidence of a Gaussian distribution of the heights and the values of φ=0.89 eV and σ0= 145 meV for the mean barrier height and standard deviation. The conventional Richardson plot exhibits non-linearity with activation energy of 0.53 eV and the Richardson constant value of 4.25 × 10– 6 Acm– 2 K– 2. From the C-V characteristics, measured at 1 MHz the capacitance was determined to increase with increasing temperature. C-V measurements have resulted in higher barrier heights than those obtained from I-V measurements. As a result, it can be concluded that the temperature dependent characteristic parameters for Pd/V/n-InP SBDs can be successfully explained on the basis of TE mechanism with Gaussian distribution of the barrier heights.When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/27909
机译:已在200-400 K的温度范围内系统地研究了非掺杂n型InP肖特基势垒二极管(SBD)上Pd / V触点的电流-电压(IV)和电容-电压(CV)特性与温度的关系。过渡金属钯(Pd)用作第二接触层,因为它具有较高的功函,可在低温下与InP反应并改善了接触形态。发现理想因子(n)和零偏置势垒高度与温度密切相关,而零偏置势垒高度Φbo(I-V)增加,而理想因子n随着温度升高而减小。器件的BH和n的实验值分别在200 K,0.45 eV(I-V),0.69(C-V)eV和4008 K下分别为0.48 eV(I-V),0.85 eV(C-V)和4.87。 I-V特性是根据热电子发射(TE)理论和由于金属-半导体界面处普遍存在的势垒不均匀性导致的势垒高度的高斯分布的假设进行分析的。绘制了零偏势垒高度Φbo与1 / 2kT的关系图,以获得高度的高斯分布证据,并且平均势垒高度和标准偏差的值分别为φ= 0.89 eV和σ0= 145 meV。传统的理查森图显示非线性,其激活能量为0.53 eV,理查森常数值为4.25×10–6 Acm– 2 K–2。根据CV特性,在1 MHz下测量,电容随温度升高而增加。 。 C-V测量导致的势垒高度高于I-V测量获得的势垒高度。结果是可以得出结论,在TE机制的基础上,势垒高度的高斯分布可以成功地解释Pd / V / n-InP SBD的温度相关特征参数。以下链接http://essuir.sumdu.edu.ua/handle/123456789/27909

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