机译:n-MOS SLS ELA多晶TFT在热载流子应力期间的退化和寿命估计:沟道宽度在Vth≤V_(GS,应力)≤V_(DS,应力)/ 2范围内的影响
Institute of Microelectronics, NCSR Demokritos, Aghia Paraskevi 15310, Greece;
Institute of Microelectronics, NCSR Demokritos, Aghia Paraskevi 15310, Greece;
Institute of Microelectronics, NCSR Demokritos, Aghia Paraskevi 15310, Greece;
Physics Department, University of Athens, Athens 157 84, Greece;
Material and Device Applications Laboratory, Sharp Labs of America, 5700 NM Pacific Rim Blvd, Camas, WA 98607, USA;
机译:热载流子应力引起的SLS ELA多晶硅TFT退化-栅极宽度变化和器件方向的影响
机译:关于LTPS TFT应力行为的V_(g,max)-V_(th)参数的重要性
机译:极性平衡驱动方案可抑制a-Si:H TFT中由于VOLED的正栅极偏置应力而导致的V_ {rm th} $的劣化
机译:薄膜SOI nMOSFET在V_(GS)≈V_(TH)应力下的新型器件寿命行为和热载流子降解机制
机译:由于高场,热载流子和辐射应力,n沟道多晶硅TFT的器件性能下降
机译:再氧化氮化物氧化物p-mOsFET的通道热载流子应力