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Temperature and thermal characteristics of InGaN/GaN vertical light-emitting diodes on electroplated copper

机译:电镀铜上的InGaN / GaN垂直发光二极管的温度和热特性

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摘要

We report the InGaN/GaN multiple quantum well vertical light-emitting diodes (VLEDs) operating at λ~ 450 nm by the use of laser lift-off and copper electroplating processes. The thermal characteristics of fabricated VLEDs are measured and analyzed in terms of the junction temperature (T_j) using the forward voltage method, which allows us to estimate the thermal resistance (R_(th))- Between 298 and 378 K, the characteristic temperature is measured to be about 903 K at 350 mA. The far-field patterns of the VLED have a uniform and good near-Lambertian emission. The T_j and R_(th) values are also confirmed by the emission peak wavelength shift method. The use of electroplated copper with a high thermal conductivity instead of a sapphire substrate provides much better heat dissipation capability. For a 1 × 1 mm~2 VLED, the low T_j value of 305.8 K is obtained with an output power of 191 mW at an injection current of 350 mA at 298 K, exhibiting R_(th) = 7.98 K W~(-1).
机译:我们报告了通过使用激光剥离和铜电镀工艺在λ〜450 nm下工作的InGaN / GaN多量子阱垂直发光二极管(VLED)。使用正向电压方法根据结温(T_j)测量和分析制成的VLED的热特性,这使我们能够估算热阻(R_(th))-在298和378 K之间,特征温度为在350 mA下测得约为903K。 VLED的远场模式具有均匀且良好的近朗伯发射。 T_j和R_(th)值也通过发射峰波长偏移法确定。使用具有高导热率的电镀铜代替蓝宝石衬底可提供更好的散热能力。对于1×1 mm〜2 VLED,在298 K的注入电流为350 mA时,输出功率为191 mW时,T_j值低至305.8 K,表现出R_(th)= 7.98 KW〜(-1) 。

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  • 来源
    《Semiconductor science and technology》 |2011年第5期|p.055014.1-055014.8|共8页
  • 作者单位

    Department of Electronics and Radio Engineering, Kyung Hee University, 1 Seocheon-dong,Giheung-gu, Yongin-si, Gyeonggi-do 446-701, Korea,Korea Advanced Nano Fab Center, 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-270,Korea;

    Department of Electronics and Radio Engineering, Kyung Hee University, 1 Seocheon-dong,Giheung-gu, Yongin-si, Gyeonggi-do 446-701, Korea;

    Department of Electronics and Radio Engineering, Kyung Hee University, 1 Seocheon-dong,Giheung-gu, Yongin-si, Gyeonggi-do 446-701, Korea;

    Korea Advanced Nano Fab Center, 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-270,Korea;

    Korea Advanced Nano Fab Center, 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-270,Korea;

    Korea Advanced Nano Fab Center, 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-270,Korea;

    Korea Advanced Nano Fab Center, 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-270,Korea;

    Department of Electronics and Radio Engineering, Kyung Hee University, 1 Seocheon-dong,Giheung-gu, Yongin-si, Gyeonggi-do 446-701, Korea;

    Korea Advanced Nano Fab Center, 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-270,Korea;

    Korea Advanced Nano Fab Center, 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-270,Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 01:31:19

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