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Simulation of temperature and electric field-dependent barrier traps effects in AlGaN/GaN HEMTs

机译:AlGaN / GaN HEMT中依赖于温度和电场的势垒陷阱效应的仿真

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摘要

We considered electron trapping and detrapping processes in the AlGaN barrier of AlGaN/GaN high electron mobility transistors as that trapping is the process of electrons directly tunneling from the gate metal into the AlGaN barrier traps while detrapping is electrons emission from the traps into the AlGaN conduction band by phonon-assisted tunneling. By fully coupling the electron emission characteristic time with the device thermal and electrical behavior, simulations were performed to comprehensively analyze the contributions of device bias, accounting for self-heating and electric field dependent electron detrapping. Discussions on the current-transient method for traps characterization based on these simulations and impact of traps-dependent reverse gate current on drain current collapse are presented.
机译:我们认为AlGaN / GaN高电子迁移率晶体管的AlGaN势垒中的电子俘获和去俘获过程是因为俘获是电子直接从栅极金属隧穿到AlGaN势垒阱中的过程,而去俘获是电子从陷阱中发射到AlGaN传导中声子辅助隧穿。通过将电子发射特征时间与器件的热和电行为完全耦合,进行了仿真,以全面分析器件偏置的影响,并考虑了自热和电场依赖性电子的去陷。讨论了基于这些仿真的电流瞬态方法的陷阱表征,以及与陷阱相关的反向栅极电流对漏极电流崩溃的影响。

著录项

  • 来源
    《Semiconductor science and technology》 |2015年第1期|015010.1-015010.8|共8页
  • 作者单位

    ISOM and Dpto. Ingenieria Electronica, ETSI Telecomunicacion, Universidad Politecnica de Madrid, Madrid 28040, Spain;

    ISOM and Dpto. Ingenieria Electronica, ETSI Telecomunicacion, Universidad Politecnica de Madrid, Madrid 28040, Spain;

    Naval Research Laboratory, Washington, DC 20375, USA;

    ISOM and Dpto. Ingenieria Electronica, ETSI Telecomunicacion, Universidad Politecnica de Madrid, Madrid 28040, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    AlGaN/GaN HEMTs; reverse gate current; barrier traps;

    机译:AlGaN / GaN HEMT;反向栅极电流;屏障陷阱;
  • 入库时间 2022-08-18 01:30:07

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