Inside the Physics of Dielectric Films

摘要

We characterized the dielectric properties of thin-film materials using a capacitive stack approach. Dielectric constant and loss tangent measurements were taken using a stacked MIS topology for single bias and frequency as well as a frequency sweep analysis. Multiple dielectric films were also measured and compared with theoretical predictions. Measurement of dielectric constant vs. frequency followed the generalized model of inverse proportionality to frequency. For dual insulator dielectrics, the measured dielectric constant closely matched the modeled value.