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Electrical Properties of Amorphous-Indium-Gallium-Zinc-Oxide Based Thin-Film Transistors with Four Terminal Configuration

机译:具有四端子配置的基于非晶铟镓锌氧化物的薄膜晶体管的电性能

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摘要

This study extracted the intrinsic device properties of indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFTs) from four terminal (4T) measurements and compared them with the extrinsic properties which were deduced from conventional two terminal (2T) measurements to explore the effects of any resistances, including the source/drain metal contacts and the channel, on the IGZO TFT properties. For operation in the linear region at low V-DS, the intrinsic channel (RCh-intrinsic) and contact resistances (RC-intrinsic), which were higher than the extrinsic channel (RCh-extrinsic) and contact ones, respectively, were of the same order of magnitude (183 k Omega at V-GS = 10 V), indicating that the operation of the TFTs is governed by both the intrinsic channel and intrinsic contact resistances. The developed TFTs also exhibited an intrinsic 4T linear mobility of 4.4 cm(2)/Vs, which is about 61% lower than the extrinsic 2T one. This was attributed to the higher value of RCh-intrinsic compared to RCh-extrinsic.
机译:这项研究从四端子(4T)测量中提取了铟镓锌氧化物(IGZO)薄膜晶体管(TFT)的本征器件特性,并将其与从常规两端子(2T)测量得出的非本征特性进行了比较。探索任何电阻(包括源极/漏极金属触点和沟道)对IGZO TFT特性的影响。对于在低V-DS的线性区域中工作,本征通道(RCh-本征)和接触电阻(RC-本征)分别高于非本征通道(RCh-本征)和接触电阻。相同的数量级(在V-GS = 10 V时为183 k Omega),表明TFT的操作受本征沟道和本征接触电阻的支配。所开发的TFT还表现出4.4 cm(2)/ Vs的固有4T线性迁移率,比非固有2T低约61%。这归因于与RCH-外源性相比,RCH-内源性值更高。

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