Disclosed is a method of modifying positional readout data, the method comprising: obtaining a dynamical positioning condition of a substrate during application of one or more patterns tu the substrate using a lithographic apparatus; obtaining positional readout data of first features comprised within the patterns on the substrate; using the obtained dynamical positioning condition to determine an expected difference between a first positional shift associated with the first features and a second positional shift associated with either second features comprised within the patterns on the substrate or an aerial image of the first features; and modifying the positional readout data based on the expected difference.
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